Broadband thin-film polarizers for high-power laser systems

Applied Optics

Volumn 52, Issue 7, 2013, Pages 1512-1516

  Zhang, Jinlong ^a,b   Xie, Yujiang ^a,b   Cheng, Xinbin ^a,b   Ding, Tao ^a,b   Wang, Zhanshan ^a,b  

^a TONGJI UNIVERSITY   (China)

^b BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; HAFNIUM OXIDES; HIGH POWER LASERS; OPTICAL INSTRUMENTS; THIN FILMS;

BREWSTER'S ANGLE; DAMAGE PROPERTIES; ELECTRIC FIELD DISTRIBUTIONS; HIGH CONTRAST RATIO; HIGH-POWER LASER SYSTEMS; LASER INDUCED DAMAGE THRESHOLDS; POLARIZATION BANDWIDTH; THIN-FILM POLARIZERS;

LASER DAMAGE;

EID: 84875009165     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.52.001512     Document Type: Article

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