메뉴 건너뛰기




Volumn 113, Issue 9, 2013, Pages

Influence of ambient air on the flowing afterglow of an atmospheric pressure Ar/O2 radiofrequency plasma

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION MEASUREMENTS; AMBIENT AIR; COLLISIONAL QUENCHING RATES; ENTRAINED AIR; FLOWING AFTERGLOWS; LASER INDUCED FLUORESCENCE; MEASUREMENT UNCERTAINTY; OH RADICAL; RADIAL GRADIENT; RADIO FREQUENCY PLASMA; SEPARATION DISTANCES; SPATIALLY RESOLVED MASS SPECTROMETRY;

EID: 84874778071     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4794324     Document Type: Article
Times cited : (14)

References (47)
  • 1
    • 29944436549 scopus 로고    scopus 로고
    • Atmospheric plasma deposition of coatings using a capacitive discharge source
    • 10.1002/cvde.200400022
    • M. Moravej and R. F. Hicks, " Atmospheric plasma deposition of coatings using a capacitive discharge source.," Chem. Vap. Deposition 11, 469-476 (2005). 10.1002/cvde.200400022
    • (2005) Chem. Vap. Deposition , vol.11 , pp. 469-476
    • Moravej, M.1    Hicks, R.F.2
  • 2
    • 78149460864 scopus 로고    scopus 로고
    • One step polymerization of sulfonated polystyrene films in a dielectric barrier discharge
    • 10.1002/ppa201000024
    • D. Merche, J. Hubert, C. Poleunis, S. Yunus, P. Bertrand, P. De Keyzer, and F. Reniers, " One step polymerization of sulfonated polystyrene films in a dielectric barrier discharge.," Plasma Process. Polym. 7, 836-845 (2010). 10.1002/ppap.201000024
    • (2010) Plasma Process. Polym. , vol.7 , pp. 836-845
    • Merche, D.1    Hubert, J.2    Poleunis, C.3    Yunus, S.4    Bertrand, P.5    De Keyzer, P.6    Reniers, F.7
  • 3
    • 77956237126 scopus 로고    scopus 로고
    • Poly(ethylene glycol) films deposited by atmospheric pressure plasma liquid deposition and atmospheric pressure plasma-enhanced chemical vapour deposition: Process, chemical composition analysis and biocompatibility
    • 10.1002/ppa201000023
    • B. Nisol, C. Poleunis, P. Bertrand, and F. Reniers, " Poly(ethylene glycol) films deposited by atmospheric pressure plasma liquid deposition and atmospheric pressure plasma-enhanced chemical vapour deposition: Process, chemical composition analysis and biocompatibility.," Plasma Process. Polym. 7, 715-725 (2010). 10.1002/ppap.201000023
    • (2010) Plasma Process. Polym. , vol.7 , pp. 715-725
    • Nisol, B.1    Poleunis, C.2    Bertrand, P.3    Reniers, F.4
  • 4
    • 77954286670 scopus 로고    scopus 로고
    • How to increase the hydrophobicity of PTFE surfaces using an r.f. atmospheric-pressure plasma torch
    • 10.1002/sia.3384
    • E. Carbone, N. Boucher, M. Sferrazza, and F. Reniers, " How to increase the hydrophobicity of PTFE surfaces using an r.f. atmospheric-pressure plasma torch.," Surf. Interface Anal. 42, 1014-1018 (2010). 10.1002/sia.3384
    • (2010) Surf. Interface Anal. , vol.42 , pp. 1014-1018
    • Carbone, E.1    Boucher, N.2    Sferrazza, M.3    Reniers, F.4
  • 5
    • 79959367718 scopus 로고    scopus 로고
    • Surface modification of polypropylene with an atmospheric pressure plasma jet sustained in argon and an argon/water vapour mixture
    • 10.1016/j.apsusc.2011.05.071
    • A. Sarani, A. Y. Nikiforov, N. D. Geyter, R. Morent, and C. Leys, " Surface modification of polypropylene with an atmospheric pressure plasma jet sustained in argon and an argon/water vapour mixture.," Appl. Surf. Sci. 257, 8737-8741 (2011). 10.1016/j.apsusc.2011.05.071
    • (2011) Appl. Surf. Sci. , vol.257 , pp. 8737-8741
    • Sarani, A.1    Nikiforov, A.Y.2    Geyter, N.D.3    Morent, R.4    Leys, C.5
  • 11
    • 0000175842 scopus 로고
    • The absorption of ozone in the ultra-violet and visible regions of the spectrum
    • 10.1088/0370-1328/78/5/340
    • A. G. Hearn, " The absorption of ozone in the ultra-violet and visible regions of the spectrum.," Proc. Phys. Soc. 78, 932-940 (1961). 10.1088/0370-1328/78/5/340
    • (1961) Proc. Phys. Soc. , vol.78 , pp. 932-940
    • Hearn, A.G.1
  • 12
    • 0001505599 scopus 로고
    • Absorption cross-sections of atmospheric gases for use in aeronomy
    • 10.1139/v69-298
    • R. E. Huffman, " Absorption cross-sections of atmospheric gases for use in aeronomy.," Can. J. Chem. 47, 1823-1834 (1969). 10.1139/v69-298
    • (1969) Can. J. Chem. , vol.47 , pp. 1823-1834
    • Huffman, R.E.1
  • 13
    • 0000456991 scopus 로고
    • Absorption cross sections of stratospheric molecules
    • 10.1139/v74-218
    • R. D. Hudson, " Absorption cross sections of stratospheric molecules.," Can. J. Chem. 52, 1465-1478 (1974). 10.1139/v74-218
    • (1974) Can. J. Chem. , vol.52 , pp. 1465-1478
    • Hudson, R.D.1
  • 14
    • 0141795335 scopus 로고    scopus 로고
    • Absorption cross-section measurements of water vapor in the wavelength region 181-199 nm
    • 10.1016/S0301-0104(03)00361-6
    • W. Parkinson and K. Yoshino, " Absorption cross-section measurements of water vapor in the wavelength region 181-199 nm.," Chem. Phys. 294, 31-35 (2003). 10.1016/S0301-0104(03)00361-6
    • (2003) Chem. Phys. , vol.294 , pp. 31-35
    • Parkinson, W.1    Yoshino, K.2
  • 17
    • 0030172986 scopus 로고    scopus 로고
    • A detailed rate equation model for the simulation of energy transfer in OH laser-induced fluorescence
    • 10.1007/BF01081697
    • R. Kienle, M. P. Lee, and K. Kohse-Höinghaus, " A detailed rate equation model for the simulation of energy transfer in OH laser-induced fluorescence.," Appl. Phys. B 62, 583-599 (1996). 10.1007/BF01081697
    • (1996) Appl. Phys. B , vol.62 , pp. 583-599
    • Kienle, R.1    Lee, M.P.2    Kohse-Höinghaus, K.3
  • 18
    • 0032144991 scopus 로고    scopus 로고
    • Collisional quenching of CH(A), OH(A), and NO(A) in low pressure hydrocarbon flames
    • 10.1016/S0010-2180(97)00324-6
    • M. Tamura, P. A. Berg, J. E. Harrington, J. Luque, J. B. Jeffries, G. P. Smith, and D. R. Crosley, " Collisional quenching of CH(A), OH(A), and NO(A) in low pressure hydrocarbon flames.," Combust. Flame 114, 502-514 (1998). 10.1016/S0010-2180(97)00324-6
    • (1998) Combust. Flame , vol.114 , pp. 502-514
    • Tamura, M.1    Berg, P.A.2    Harrington, J.E.3    Luque, J.4    Jeffries, J.B.5    Smith, G.P.6    Crosley, D.R.7
  • 19
    • 75449112393 scopus 로고    scopus 로고
    • 2 concentrations during the MCMA-2006 field campaign - Part 1: Deployment of the Indiana University laser-induced fluorescence instrument
    • 10.5194/acp-9-1665-2009
    • 2 concentrations during the MCMA-2006 field campaign-Part 1: Deployment of the Indiana University laser-induced fluorescence instrument.," Atmos. Chem. Phys. 9, 1665-1685 (2009). 10.5194/acp-9-1665-2009
    • (2009) Atmos. Chem. Phys. , vol.9 , pp. 1665-1685
    • Dusanter, S.1    Vimal, D.2    Stevens, P.S.3    Volkamer, R.4    Molina, L.T.5
  • 20
    • 34250162906 scopus 로고    scopus 로고
    • Production and reactivity of the hydroxyl radical in homogeneous high pressure plasmas of atmospheric gases containing traces of light olefins
    • 10.1088/0022-3727/40/10/015
    • L. Magne, S. Pasquiers, N. Blin-Simiand, and C. Postel, " Production and reactivity of the hydroxyl radical in homogeneous high pressure plasmas of atmospheric gases containing traces of light olefins.," J. Phys. D: Appl. Phys. 40, 3112-3127 (2007). 10.1088/0022-3727/40/10/015
    • (2007) J. Phys. D: Appl. Phys. , vol.40 , pp. 3112-3127
    • Magne, L.1    Pasquiers, S.2    Blin-Simiand, N.3    Postel, C.4
  • 22
    • 80054980876 scopus 로고    scopus 로고
    • Density and temperature measurement of OH radicals in atmospheric-pressure pulsed corona discharge in humid air
    • 10.1063/1.3638457
    • Y. Nakagawa, R. Ono, and T. Oda, " Density and temperature measurement of OH radicals in atmospheric-pressure pulsed corona discharge in humid air.," J. Appl. Phys. 110, 073304 (2011). 10.1063/1.3638457
    • (2011) J. Appl. Phys. , vol.110 , pp. 073304
    • Nakagawa, Y.1    Ono, R.2    Oda, T.3
  • 23
    • 43049083719 scopus 로고    scopus 로고
    • Measurement of gas temperature and OH density in the afterglow of pulsed positive corona discharge
    • 10.1088/0022-3727/41/3/035204
    • R. Ono and T. Oda, " Measurement of gas temperature and OH density in the afterglow of pulsed positive corona discharge.," J. Phys. D: Appl. Phys. 41, 035204 (2008). 10.1088/0022-3727/41/3/035204
    • (2008) J. Phys. D: Appl. Phys. , vol.41 , pp. 035204
    • Ono, R.1    Oda, T.2
  • 24
    • 79951639611 scopus 로고    scopus 로고
    • Absolute concentration of OH radicals in atmospheric pressure glow discharges with a liquid electrode measured by laser-induced fluorescence spectroscopy
    • 10.1143/APEX.4.026102
    • A. Nikiforov, Q. Xiong, N. Britun, R. Snyders, X. P. Lu, and C. Leys, " Absolute concentration of OH radicals in atmospheric pressure glow discharges with a liquid electrode measured by laser-induced fluorescence spectroscopy.," Appl. Phys. Express 4, 026102 (2011). 10.1143/APEX.4.026102
    • (2011) Appl. Phys. Express , vol.4 , pp. 026102
    • Nikiforov, A.1    Xiong, Q.2    Britun, N.3    Snyders, R.4    Lu, X.P.5    Leys, C.6
  • 25
    • 33748847556 scopus 로고    scopus 로고
    • A spectroscopic method to determine the electron temperature of an argon surface wave sustained plasmas using a collision radiative model
    • 10.1088/0022-3727/39/19/011
    • N. d. Vries, E. Iordanova, A. Hartgers, E. M. v. Veldhuizen, M. J. v. d. Donker, and J. J. A. M. van der Mullen, " A spectroscopic method to determine the electron temperature of an argon surface wave sustained plasmas using a collision radiative model.," J. Phys. D: Appl. Phys. 39, 4194-4203 (2006). 10.1088/0022-3727/39/19/011
    • (2006) J. Phys. D: Appl. Phys. , vol.39 , pp. 4194-4203
    • Vries N, D.1    Iordanova, E.2    Hartgers, A.3    Veldhuizen E M, V.4    Donker M J, V.D.5    Der Mullen, J.J.A.M.V.6
  • 26
    • 0033719034 scopus 로고    scopus 로고
    • Rotational temperature measurements in atmospheric pulsed dielectric barrier discharge-gas temperature and molecular fraction effects
    • 10.1088/0022-3727/33/12/311
    • O. Motret, C. Hibert, S. Pellerin, and J. Pouvesle, " Rotational temperature measurements in atmospheric pulsed dielectric barrier discharge-gas temperature and molecular fraction effects.," J. Phys. D: Appl. Phys. 33, 1493 (2000). 10.1088/0022-3727/33/12/311
    • (2000) J. Phys. D: Appl. Phys. , vol.33 , pp. 1493
    • Motret, O.1    Hibert, C.2    Pellerin, S.3    Pouvesle, J.4
  • 27
    • 76649116273 scopus 로고    scopus 로고
    • Electronic quenching of OH (A) by water in atmospheric pressure plasmas and its influence on the gas temperature determination by OH (A-X) emission
    • 10.1088/0963-0252/19/1/015016
    • P. Bruggeman, F. Iza, P. Guns, D. Lauwers, M. Kong, Y. Gonzalvo, C. Leys, and D. Schram, " Electronic quenching of OH (A) by water in atmospheric pressure plasmas and its influence on the gas temperature determination by OH (A-X) emission.," Plasma Sources Sci. Technol. 19, 015016 (2010). 10.1088/0963-0252/19/1/015016
    • (2010) Plasma Sources Sci. Technol. , vol.19 , pp. 015016
    • Bruggeman, P.1    Iza, F.2    Guns, P.3    Lauwers, D.4    Kong, M.5    Gonzalvo, Y.6    Leys, C.7    Schram, D.8
  • 28
    • 78249271030 scopus 로고    scopus 로고
    • High-speed dispersed photographing of an open-air argon plasma plume by a grating-ICCD camera system
    • 10.1088/0022-3727/43/41/415201
    • Q. Xiong, A. Nikiforov, X. Lu, and C. Leys, " High-speed dispersed photographing of an open-air argon plasma plume by a grating-ICCD camera system.," J. Phys. D: Appl. Phys. 43, 415201 (2010). 10.1088/0022-3727/43/ 41/415201
    • (2010) J. Phys. D: Appl. Phys. , vol.43 , pp. 415201
    • Xiong, Q.1    Nikiforov, A.2    Lu, X.3    Leys, C.4
  • 31
    • 0345121647 scopus 로고
    • 2O → Rg + OH (A Σ + 2) + H (Rg = Ar, Kr)
    • 10.1063/1.454163
    • 2O → Rg + OH (A Σ + 2) + H (Rg = Ar, Kr).," J. Chem. Phys. 88, 835 (1988). 10.1063/1.454163
    • (1988) J. Chem. Phys. , vol.88 , pp. 835
    • Tabayashi, K.1    Shobatake, K.2
  • 33
    • 36549095384 scopus 로고
    • Electronic quenching, rotational relaxation, and radiative lifetime of NH(A Π 3, ν ′ = 0, N′)
    • 10.1063/1.448213
    • A. Hofzumahaus and F. Stuhl, " Electronic quenching, rotational relaxation, and radiative lifetime of NH(A Π 3, ν ′ = 0, N′).," J. Chem. Phys. 82, 3152-3159 (1985). 10.1063/1.448213
    • (1985) J. Chem. Phys. , vol.82 , pp. 3152-3159
    • Hofzumahaus, A.1    Stuhl, F.2
  • 34
    • 80052927750 scopus 로고    scopus 로고
    • Effects of water addition on OH radical generation and plasma properties in an atmospheric argon microwave plasma jet
    • 10.1063/1.3632970
    • N. Srivastava and C. Wang, " Effects of water addition on OH radical generation and plasma properties in an atmospheric argon microwave plasma jet.," J. Appl. Phys. 110, 053304 (2011). 10.1063/1.3632970
    • (2011) J. Appl. Phys. , vol.110 , pp. 053304
    • Srivastava, N.1    Wang, C.2
  • 35
    • 0000256940 scopus 로고
    • Energy transfer in A Σ + 2 OH. I. Rotational
    • 10.1063/1.435095
    • R. K. Lengel and D. R. Crosley, " Energy transfer in A Σ + 2 OH. I. Rotational.," J. Chem. Phys. 67, 2085-2101 (1977). 10.1063/1.435095
    • (1977) J. Chem. Phys. , vol.67 , pp. 2085-2101
    • Lengel, R.K.1    Crosley, D.R.2
  • 36
    • 0008917603 scopus 로고    scopus 로고
    • A scaling formalism for the representation of rotational energy transfer in OH (A 2 Σ +) in combustion studies
    • 10.1007/BF01828746.
    • R. Kienle, M. P. Lee, and K. Kohse-Höinghaus, " A scaling formalism for the representation of rotational energy transfer in OH (A 2 Σ +) in combustion studies.," Appl. Phys. B 63, 403-418 (1996) 10.1007/BF01828746.
    • (1996) Appl. Phys. B , vol.63 , pp. 403-418
    • Kienle, R.1    Lee, M.P.2    Kohse-Höinghaus, K.3
  • 37
    • 0001745313 scopus 로고
    • Quenching of A 2 Σ + OH at 300 K by several colliders
    • 10.1063/1.458558
    • I. J. Wysong, J. B. Jeffries, and D. R. Crosley, " Quenching of A 2 Σ + OH at 300 K by several colliders.," J. Chem. Phys. 92, 5218-5222 (1990). 10.1063/1.458558
    • (1990) J. Chem. Phys. , vol.92 , pp. 5218-5222
    • Wysong, I.J.1    Jeffries, J.B.2    Crosley, D.R.3
  • 38
    • 36549092560 scopus 로고
    • 2(C Π u 3) and the Herman infrared system
    • 10.1063/1.454649
    • 2(C Π u 3) and the Herman infrared system.," J. Chem. Phys. 88, 231-239 (1988). 10.1063/1.454649
    • (1988) J. Chem. Phys. , vol.88 , pp. 231-239
    • Piper, L.G.1
  • 39
    • 0040574228 scopus 로고
    • Comparison of the Ar(P 2 3) and Ar(P 0 3) reactions with chlorine and fluorine containing molecules: Propensity for ion-core conservation
    • 10.1063/1.456691
    • N. Sadeghi, M. Cheaib, and D. W. Setser, " Comparison of the Ar(P 2 3) and Ar(P 0 3) reactions with chlorine and fluorine containing molecules: Propensity for ion-core conservation.," J. Chem. Phys. 90, 219-231 (1989). 10.1063/1.456691
    • (1989) J. Chem. Phys. , vol.90 , pp. 219-231
    • Sadeghi, N.1    Cheaib, M.2    Setser, D.W.3
  • 42
    • 0034348301 scopus 로고    scopus 로고
    • 2O molecules
    • 10.1016/S0301-0104(00)00338-4
    • 2O molecules.," Chem. Phys. 262, 349-357 (2000). 10.1016/S0301-0104(00)00338-4
    • (2000) Chem. Phys. , vol.262 , pp. 349-357
    • Pancheshnyi, S.1
  • 45
    • 84874762575 scopus 로고    scopus 로고
    • NIST ASD Team, NIST Atomic Spectra Database (version 4.1) [Online], edited by National Institute of Standards and Technology, Gaithersburg, MD, 2011, Available: [Monday, 20-Feb-2012 17:02:02 EST].
    • Y. Ralchenko, A. Kramida, J. Reader, and NIST ASD Team, NIST Atomic Spectra Database (version 4.1) [Online], edited by National Institute of Standards and Technology, Gaithersburg, MD, 2011, Available: http://physics.nist.gov/asd [Monday, 20-Feb-2012 17:02:02 EST].
    • Ralchenko, Y.1    Kramida, A.2    Reader, J.3
  • 46
    • 72449188348 scopus 로고    scopus 로고
    • A simple collisional-radiative model for low-temperature argon discharges with pressure ranging from 1 Pa to atmospheric pressure: Kinetics of Paschen 1s and 2p levels
    • 10.1088/0022-3727/43/1/015204
    • X.-M. Zhu and Y.-K. Pu, " A simple collisional-radiative model for low-temperature argon discharges with pressure ranging from 1 Pa to atmospheric pressure: kinetics of Paschen 1s and 2p levels.," J. Phys. D: Appl. Phys. 43, 015204 (2010). 10.1088/0022-3727/43/1/015204
    • (2010) J. Phys. D: Appl. Phys. , vol.43 , pp. 015204
    • Zhu, X.-M.1    Pu, Y.-K.2
  • 47
    • 0037285214 scopus 로고    scopus 로고
    • Dielectric-barrier discharges: Their history, discharge physics, and industrial applications
    • 10.1023/A:1022470901385
    • U. Kogelschatz, " Dielectric-barrier discharges: Their history, discharge physics, and industrial applications.," Plasma Chem. Plasma Process. 23, 1-46 (2003). 10.1023/A:1022470901385
    • (2003) Plasma Chem. Plasma Process. , vol.23 , pp. 1-46
    • Kogelschatz, U.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.