Constructing robust and functional micropatterns on polystyrene surfaces by using deep UV irradiation

Langmuir

Volumn 29, Issue 8, 2013, Pages 2756-2763

  Palacios, Marta ^a   García, Olga ^a   Rodríguez Hernández, Juan ^a  

^a INSTITUTO DE CIENCIA Y TECNOLOGÍA DE POLÍMEROS   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

2 ,3 ,4 ,5 ,6-PENTAFLUOROSTYRENE; ACTIVE SPECIES; CHEMICAL COMPOSITIONS; DEEP UV; DEGRADATION OF THE MATERIAL; EXPOSURE-TIME; IRRADIATION TIME; MICROPATTERNS; NEGATIVE PHOTORESISTS; PHOTO-INITIATOR; PHOTOCROSS-LINKING; PHOTOINITIATORS; SURFACE CHEMICAL COMPOSITION; SURFACE PATTERN;

BLOCK COPOLYMERS; PHOTORESISTS; TEXTILE PRINTING;

POLYSTYRENES;

POLYSTYRENE DERIVATIVE;

ARTICLE; CHEMICAL STRUCTURE; CHEMISTRY; KINETICS; SURFACE PROPERTY; SYNTHESIS; ULTRAVIOLET RADIATION;

KINETICS; MOLECULAR STRUCTURE; POLYSTYRENES; SURFACE PROPERTIES; ULTRAVIOLET RAYS;

EID: 84874416060     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la304931x     Document Type: Article

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