Do SEII electrons really degrade SEM image quality?

Scanning

Volumn 35, Issue 1, 2013, Pages 1-6

  Bernstein, Gary H ^a   Carter, Andrew D ^b   Joy, David C ^c  

^a University of Notre Dame   (United States)

^b University of California   (United States)

^c University of Tennessee Knoxville   (United States)

Author keywords

backscattered electrons; electron beam lithography; Monte Carlo simulations; scanning electron microscopy; secondary electrons

Indexed keywords

BACKGROUND SIGNALS; BACKSCATTERED ELECTRONS; HIGH RESOLUTION IMAGE; HIGHEST RESOLUTIONS; LENS SYSTEMS; MICROFABRICATED; MONTE CARLO SIMULATION; PINHOLE LENS; PRIMARY ELECTRON BEAMS; SECONDARY ELECTRONS; SEM IMAGE; SEM IMAGING; SIGNAL COMPONENTS; UNDESIRED SIGNAL COMPONENTS;

DIAPHRAGMS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON SCATTERING; MONTE CARLO METHODS; SCANNING ELECTRON MICROSCOPY; SECONDARY EMISSION;

BACKSCATTERING;

GOLD NANOPARTICLE;

ARTICLE; BRIGHTNESS; CRYSTAL STRUCTURE; ELECTRON; IMAGE QUALITY; MICROPHOTOGRAPHY; MICROTECHNOLOGY; MONTE CARLO METHOD; NANOFABRICATION; PARTICLE SIZE; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; SIGNAL NOISE RATIO;

EID: 84874105221     PISSN: 01610457     EISSN: 19328745     Source Type: Journal    
DOI: 10.1002/sca.21027     Document Type: Article

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