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Applied Physics Letters

Volumn 102, Issue 5, 2013, Pages

Surface doping of nitrogen atoms on graphene via molecular precursor

(7) Hong, Guo a,b Wu, Qi Hui a,b Wang, Chundong b Ren, Jianguo a,b Xu, Tingting a,b Zhang, Wenjun b Lee, Shuit Tong a

a SOOCHOW UNIVERSITY (China)

b CITY UNIVERSITY OF HONG KONG (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT CONDITIONS; ATOMIC SURFACES; ELECTRONIC PROPERTIES OF GRAPHENE; HYDROGEN PLASMA TREATMENTS; MOLECULAR PRECURSOR; NITROGEN ATOM; PATTERNING PROCESS; PRECURSOR MOLECULES; SITE SELECTIVE; SURFACE DOPING; TCNQ MOLECULE; TETRAFLUORO-TETRACYANOQUINODIMETHANE;

ATOMS; ELECTRONIC PROPERTIES; FLUORINE; PLASMA APPLICATIONS;

GRAPHENE;

EID: 84874064217 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.4790573 Document Type: Article

Times cited : (16)

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