Nano-size structure formation on Si substrate for optical device application

Proceedings of IEEE Sensors

Volumn , Issue , 2012, Pages

  Kong, Daeyoung ^a   Oh, Junghwa ^a   Kim, Bonghwan ^b   Cho, Chanseob ^a   Lee, Jonghyun ^a  

^a Kyungpook National University   (South Korea)

^b Catholic University of Daegu   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DEVICE APPLICATION; METAL MESH; NANO-SIZE; PROCESS TIME; RANDOM TEXTURES; RF-POWER; SI SUBSTRATES; STRUCTURE FORMATIONS; WAFER SURFACE;

OPTIMIZATION; SENSORS; SILICON; SULFUR HEXAFLUORIDE; TEXTURES;

SILICON WAFERS;

EID: 84873960428     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICSENS.2012.6411291     Document Type: Conference Paper

References (8)

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