Nanoscale origin of defects at metal/molecule engineered interfaces

Langmuir

Volumn 29, Issue 5, 2013, Pages 1340-1345

  Nirmalraj, Peter N ^a   Schmid, Heinz ^a   Gotsmann, Bernd ^a   Riel, Heike ^a  

^a IBM RESEARCH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECT HEALING; DEFECT SITES; IN-SITU SCANNING TUNNELING MICROSCOPIES; METAL DEPOSITION; METAL SURFACES; MOLECULAR ARCHITECTURE; MOLECULAR JUNCTION; MOLECULAR LAYER; NANO SCALE; NANO-METER-SCALE; SELF-ASSEMBLED; SPATIAL RESOLUTION; SUBSTRATE TEMPERATURE; ULTRAFLAT;

METAL HALIDES; MICA; MOLECULAR ELECTRONICS; SCANNING TUNNELING MICROSCOPY;

DEFECTS;

EID: 84873403330     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la3046109     Document Type: Article

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