DC electrodeposition of thick SmCo films for MEMS applications

Journal of the Electrochemical Society

Volumn 159, Issue 10, 2012, Pages

  Chouarbi, K ^a,b   Woytasik, M ^a   Dufour Gergam, E ^a   Lefeuvre, E ^a   Moulin, J ^a  

^a UNIVERSITÉ PARIS SACLAY   (France)

^b STMICROELECTRONICS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT ION; DC ELECTRODEPOSITION; DEPOSITION TIME; HULL CELL; MEMS APPLICATIONS; OXYGEN CONTAMINATION; SMCO FILMS; SUPPORTING ELECTROLYTE;

DEPOSITION; ELECTROLYTES; SAMARIUM;

ELECTRODEPOSITION;

EID: 84873253813     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/2.051210jes     Document Type: Article

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