Thermal stress in silica-on-silicon disk resonators

Applied Physics Letters

Volumn 102, Issue 3, 2013, Pages

  Chen, Tong ^a   Lee, Hansuek ^a   Vahala, Kerry J ^a  

^a California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL OF STRESS; DISK RESONATOR; DISK STRUCTURES; FINITE ELEMENT; HIGH-Q RESONANCES; OPTICAL PERFORMANCE; OXIDE LAYER; ROOM TEMPERATURE; SILICA-ON-SILICON; STRESS IMPACT; THERMAL EXPANSION MISMATCH; WHISPERING GALLERY;

SILICON; SILICON WAFERS; THERMAL EXPANSION;

SILICA;

EID: 84872946996     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4789370     Document Type: Article

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