Quantifying the intrinsic amount of fabrication disorder in photonic-crystal waveguides from optical far-field intensity measurements

Applied Physics Letters

Volumn 102, Issue 3, 2013, Pages

  Garcia P D ^a   Javadi, A ^a   Thyrrestrup, H ^a   Lodahl, P ^a  

^a UNIVERSITY OF COPENHAGEN   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

ANDERSON LOCALIZATION; DEVICE PERFORMANCE; FABRICATION DISORDERS; FABRICATION IMPERFECTIONS; FAR FIELD MEASUREMENT; FAR-FIELD INTENSITY MEASUREMENTS; PHOTONIC CRYSTAL WAVEGUIDE; RADIATION LOSS; SPECTRAL RANGE;

NANOPHOTONICS;

WAVEGUIDE COMPONENTS;

EID: 84872904445     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4788709     Document Type: Article

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