Processing optimization and sintering time dependent magnetic and optical behaviors of Aurivillius Bi5Ti3FeO15 ceramics

Journal of Applied Physics

Volumn 113, Issue 3, 2013, Pages

  Chen, Guang ^a   Bai, Wei ^a,b   Sun, Lin ^a   Wu, Jing ^b   Ren, Qing ^a   Xu, Wenfei ^a   Yang, Jing ^a   Meng, Xiangjian ^b   Tang, Xiaodong ^a   Duan, Chun Gang ^a,b   Chu, Junhao ^a,b  

^a EAST CHINA NORMAL UNIVERSITY   (China)

^b SHANGHAI INSTITUTE OF TECHNICAL PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; ANTIFERROMAGNETIC INTERACTION; AURIVILLIUS; CRYSTALLINE STRUCTURE; DETECTION LIMITS; EFFECTIVE MAGNETIC MOMENTS; EXTINCTION COEFFICIENTS; IMPURITY PHASE; INTER-BAND TRANSITION; MAGNETIC BEHAVIOR; OPTICAL BEHAVIOR; OPTICAL ENERGY BAND GAP; PHOTON ENERGY RANGE; PRESENT STAGE; PROCESSING OPTIMIZATIONS; REAL PART; SCANNING ELECTRON MICROSCOPIC; SINTERING TIME; SOLID STATE REACTION METHOD; SUPERPARAMAGNETICS; XRD;

ANTIFERROMAGNETISM; CERAMIC MATERIALS; IRON OXIDES; MAGNETIC MOMENTS; OPTIMIZATION; REFRACTIVE INDEX; SOLID STATE REACTIONS; SUPERPARAMAGNETISM; X RAY DIFFRACTION;

SINTERING;

EID: 84872855245     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4775800     Document Type: Article

References (43)

1. N. A. Spaldin and M. Fiebig, Science 309, 391 (2005); 10.1126/science.1113357
2. J. F. Scott, Science 315, 954 (2007). 10.1126/science.1129564
3. K. F. Wang, J. M. Liu, and Z. F. Ren, Adv. Phys. 58, 321 (2009); 10.1080/00018730902920554
4. C. G. Duan, S. S. Jaswal, and E. Y. Tsymbal, Phys. Rev. Lett. 97, 047201 (2006). 10.1103/PhysRevLett.97.047201
5. J. Ma, J. M. Hu, Z. Li, and C. W. Nan, Adv. Mater. 23, 1062 (2011); 10.1002/adma.201003636
6. L. W. Marin, Y. H. Chu, and R. Ramesh, Mater. Sci. Eng. R 68, 89 (2010). 10.1016/j.mser.2010.03.001
7. S. L. Ahn, Y. Noguchi, M. Miyayama, and T. Kudo, Mater. Res. Bull. 35, 825 (2000). 10.1016/S0025-5408(00)00284-1
8. X. W. Dong, K. F. Wang, J. G. Wan, J. S. Zhu, and J. M. Liu, J. Appl. Phys. 103, 094101 (2008). 10.1063/1.2908219
9. W. Bai, Y. Q. Gao, J. Y. Zhu, X. J. Meng, T. Lin, J. Yang, Z. Q. Zhu, and J. H. Chu, J. Appl. Phys. 109, 064901 (2011). 10.1063/1.3553879
10. W. Bai, J. Y. Zhu, J. L. Wang, T. Lin, J. Yang, X. J. Meng, X. D. Tang, Z. Q. Zhu, and J. H. Chu, J. Magn. Magn. Mater. 324, 2265 (2012). 10.1016/j.jmmm.2012.02.113
11. X. Y. Mao, W. Wang, and X. B. Chen, Solid State Commun. 147, 186 (2008). 10.1016/j.ssc.2008.05.025
12. A. Snedden, C. H. Hervoches, and P. Lightfoot, Phys. Rev. B 67, 092102 (2003). 10.1103/PhysRevB.67.092102
13. F. Kubel and H. Schmid, Ferroelectrics 129, 101 (1992). 10.1080/00150199208016980
14. J. B. Li, Y. P. Huang, G. H. Rao, G. Y. Liu, J. Luo, J. R. Chen, and J. K. Liang, Appl. Phys. Lett. 96, 222903 (2010). 10.1063/1.3447372
15. A. Srinivas, S. V. Suryanarayana, G. S. Kumar, and M. M. Kumar, J. Phys.: Condens. Matter 11, 3335 (1999). 10.1088/0953-8984/11/16/014
16. L. Keeney, P. F. Zhang, C. Groh, M. E. Pemble, and R. W. Whatmore, J. Appl. Phys. 108, 042004 (2010). 10.1063/1.3474959
17. L. Keeney, C. Groh, S. Kulkarni, S. Roy, M. E. Pemble, and R. W. Whatmore, J. Appl. Phys. 112, 024101 (2012). 10.1063/1.4734983
18. P. F. Zhang, N. Deepak, L. Keeney, M. E. Pemble, and R. W. Whatmore, Appl. Phys. Lett. 101, 112903 (2012). 10.1063/1.4752007
19. R. S. Singh, T. Bhimasankaram, G. S. Kumar, and S. V. Suryanarayana, Solid State Commun. 91, 567 (1994). 10.1016/0038-1098(94)90376-X
20. S. M. Sun, W. Z. Wang, H. L. Xu, L. Zhou, M. Zhou, M. Shang, and L. Zhang, J. Phys. Chem. C 112, 17835 (2008) 10.1021/jp807379c
21. M. S. Wu, Z. M. Tian, S. L. Yuan, and Z. B. Huang, Mater. Lett. 68, 190 (2012) 10.1016/j.matlet.2011.09.113
22. Z. M. Huang, J. H. Chu, Y. N. Wu, Y. Hou, J. Q. Xue, and D. Y. Tang, Phys. Rev. B 72, 052106 (2005). 10.1103/PhysRevB.72.052106
23. W. Bai, G. Chen, J. Y. Zhu, J. Yang, T. Lin, X. J. Meng, X. D. Tang, C. G. Duan, and J. H. Chu. Appl. Phys. Lett. 100, 082902 (2012). 10.1063/1.3688033
24. M. Garcia-Guaderama, L. Fuentes, M. E. Montero-Cabrera, A. Marquez-Lucero, and M. E. Villafuerte-Castrejon, Integr. Ferroelectr. 71, 233 (2005) 10.1080/10584580590965401
25. J. Ilczuk, D. Machura, and J. Rymarczyk, Mol. Quantum Acoust. 28, 107 (2007).
26. S. Nakashima, H. Fujisawa, S. Ichikawa, J. M. Park, T. Kanashima, M. Okuyama, and M. Shimizu, J. Appl. Phys. 108, 074106 (2010). 10.1063/1.3491023
27. H. Sun, X. M. Lu, T. T. Xu, J. Su, Y. M. Jin, C. C. Ju, F. Z. Huang, and J. S. Zhu, J. Appl. Phys. 111, 124116 (2012). 10.1063/1.4730892
28. A. Punnoose, J. Hays, A. Thurber, M. H. Engelhard, R. K. Kukkadapu, C. Wang, V. Shutthanadan, and S. Thevuthasan, Phys. Rev. B 72, 054402 (2005). 10.1103/PhysRevB.72.054402
29. H. X. Liu, B. B. Cao, and C. O'Connor, J. Appl. Phys. 109, 07B516 (2011). 10.1063/1.3556768
30. L. Keeney, S. Kulkarni, N. Deepak, M. Schmidt, N. Petkov, P. F. Zhang, S. Cavill, S. Roy, M. E. Pemble, and R. W. Whatmore, J. Appl. Phys. 112, 052010 (2012). 10.1063/1.4745936
31. S. Vijayanand, H. S. Potdar, and P. A. Joy, Appl. Phys. Lett. 94, 182507 (2009). 10.1063/1.3132586
32. M. Palizdar, T. P. Comyn, M. B. Ward, A. P. Brown, J. P. Harrington, S. Kulkarni, L. Keeney, S. Roy, M. Pemble, R. Whatmore, C. Quinn, S. H. Kilcoyne, and A. J. Bell, J. Appl. Phys. 112, 073919 (2012). 10.1063/1.4754562
33. A.-H. Lu, E. L. Salabas, and F. Schüth, Angew. Chem., Int. Ed. 46, 1222 (2007). 10.1002/anie.200602866
34. P. G. Snyder and Y. M. Xiong, Surf. Interface Anal. 18, 107 (1992). 10.1002/sia.740180208
35. Z. G. Hu, Y. W. Li, M. Zhu, Z. Q. Zhu, and J. H. Chu, Appl. Phys. Lett. 92, 081904 (2008). 10.1063/1.2870094
36. J. H. Ma, X. J. Meng, J. L. Sun, T. Lin, F. W. Shi, and J. H. Chu, J. Phys. D: Appl. Phys. 37, 3160 (2004). 10.1088/0022-3727/37/22/017
37. M. Cardona, Phys. Rev. 140, A651 (1965). 10.1103/PhysRev.140.A651
38. J. H. Chu and A. Sher, Physics and Properties of Narrow Gap Semiconductors (Springer, New York, 2008), p. 308
39. Z. G. Hu, G. S. Wang, Z. M. Huang, and J. H. Chu, J. Appl. Phys. 93, 3811 (2003) 10.1063/1.1559003.
40. M. A. Butler, J. Appl. Phys. 48, 1914 (1977). 10.1063/1.323948
41. S. J. Clark and J. Robertson, Appl. Phys. Lett. 90, 132903 (2007). 10.1063/1.2716868
42. C. H. Jia, Y. H. Chen, and W. F. Zhang, J. Appl. Phys. 105, 113108 (2009). 10.1063/1.3138813
43. J. W. Tang, Z. G. Zou, and J. H. Ye, Chem. Mater. 16, 1644 (2004). 10.1021/cm0353815