Development of high-throughput silicon lens and grism with moth-eye antireflection structure for mid-infrared astronomy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8450, Issue , 2012, Pages

  Kamizuka, Takafumi ^a   Miyata, Takashi ^a   Sako, Shigeyuki ^a   Imada, Hiroaki ^b   Nakamura, Tomohiko ^a   Asano, Kentaro ^a   Uchiyama, Mizuho ^a   Okada, Kazushi ^a   Wada, Takehiko ^c   Nakagawa, Takao ^c   Onaka, Takashi ^a   Sakon, Itsuki ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b UNIVERSITY OF TSUKUBA   (Japan)

^c JAPAN AEROSPACE EXPLORATION AGENCY   (Japan)

Author keywords

Antireflection; Electron beam lithography; Grism; Lens; Mid infrared; Moth eye; Reactive ion etching; Silicon

Indexed keywords

ANTI-REFLECTION; ANTI-REFLECTION STRUCTURES; COATING METHODS; CONVEX SURFACES; FOCAL LENGTHS; GRATING CONSTANT; GRATING PATTERNS; GRATING SURFACE; GRISM; HIGH-THROUGHPUT; IMAGE DEGRADATION; IMAGING TESTS; MIDINFRARED; MOTH-EYE STRUCTURE; MOTHEYE; NONUNIFORMITY; RESIST COATINGS; SILICON SUBSTRATES;

COATINGS; ELECTRON BEAM LITHOGRAPHY; INFRARED DEVICES; LENSES; OPTICAL TELESCOPES; OPTICS; REACTIVE ION ETCHING; SILICON; TELESCOPES;

FABRICATION;

EID: 84872255033     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.926858     Document Type: Conference Paper

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