Preparation of TiO2/ITO film electrode by AP-MOCVD for photoelectrocatalytic application

Science China Chemistry

Volumn 55, Issue 11, 2012, Pages 2462-2470

  Song, Han ^a   Xingwang, Zhang ^a   Qingni, Yu ^b   Lecheng, Lei ^a  

^a ZHEJIANG UNIVERSITY   (China)

^b CHINA ASTRONAUT RESEARCH AND TRAINING CENTER   (China)

Author keywords

AP MOCVD; Illumination direction; Photocatalysis; Photoelectrocatalysis; Titanium oxide

Indexed keywords

AP-MOCVD; DEGRADATION RATE; ELECTRODE INTERFACE; FILM ELECTRODES; METHYL ORANGE; MOCVD METHODS; PHOTO-CATALYTIC; PHOTOELECTROCATALYSIS; PHOTOELECTROCATALYTIC; PHOTOELECTROCATALYTIC ACTIVITIES; PHOTOELECTROCHEMICAL MEASUREMENTS; PHOTOELECTRODE; REACTION SYSTEM; TIO; TITANIUM TETRAISOPROPOXIDE; TRANSMISSION ELECTRON MICROSCOPY TEM;

ATMOSPHERIC PRESSURE; AZO DYES; CHEMICAL VAPOR DEPOSITION; DEGRADATION; EXPERIMENTS; FILM PREPARATION; INTERFACES (MATERIALS); PHOTOCATALYSIS; PHOTOELECTRONS; SCANNING ELECTRON MICROSCOPY; TIN; TIN OXIDES; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ITO GLASS;

EID: 84872104026     PISSN: 16747291     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11426-012-4653-3     Document Type: Article

References (31)

1. Kim DH, Anderson MA. Photoelectrocatalytic degradation of formic-acid using a porous TiO2 thin-film electrode. Environ Sci Technol, 1994, 28(3): 479-483
2. Zhang FL, Zhao JC, Shen T, Hidaka H, Pelizzetti E, Serpone N. TiO2-assisted photodegradation of dye pollutants-II. Adsorption and degradation kinetics of eosin in TiO2 dispersions under visible light irradiation. Appl Catal B-Environ, 1998, 15(1-2): 147-156
3. Byun D, Jin Y, Kim B, Lee JK, Park D. Photocatalytic TiO2 deposition by chemical vapor deposition. J Hazard Mater, 2000, 73(2): 199-206
4. Butterfield IM, Christensen PA, Hamnett A, Shaw KE, Walker GM, Walker SA, Howarth CR. Applied studies on immobilized titanium dioxide films as catalysts for the photoelectrochemical detoxification of water. J Appl Electrochem, 1997, 27(4): 385-395
5. Giri RR, Ozaki H, Takanami R, Taniguchi S. A novel use of TiO2 fiber for photocatalytic ozonation of 2,4-dichlorophenoxyacetic acid in aqueous solution. J Environ Sci-China, 2008, 20(9): 1138-1145
6. Mizukoshi Y, Makise Y, Shuto T, Hu JW, Tominaga A, Shironita S, Tanabe S. Immobilization of noble metal nanoparticles on the surface of TiO2 by the sonochemical method: Photocatalytic production of hydrogen from an aqueous solution of ethanol. Ultrason Sonochem, 2007, 14(3): 387-392
7. Ye L, Filipe CDM, Kavoosi M, Haynes CA, Pelton R, Brook MA. Immobilization of TiO2 nanoparticles onto paper modification through bioconjugation. J Mater Chem, 2009, 19(15): 2189-2198
8. He C, Li XZ, Graham N, Wang Y. Preparation of MATO and TiO2/Ti photoelectrodes by magnetron sputtering for photocatalytic application. Appl Catal A-Gen, 2006, 305(1): 54-63
9. Zhang X, Zhou M, Lei L. Preparation of an Ag-TiO2 photocatalyst coated on activated carbon by MOCVD. Mater Chem Phys, 2005, 91(1): 73-79
10. Zhang X, Zhou M, Lei L. Enhancing the concentration of TiO2 photocatalyst on the external surface of activated carbon by MOCVD. Mater Res Bull, 2005, 40(11): 1899-1904
11. Zhang XW, Zhou MH, Lei L. Preparation of photocatalytic TiO2 coatings of nanosized particles on activated carbon by AP-MOCVD. Carbon, 2005, 43(8): 1700-1708
12. Zhang XW, Zhou MH, Lei LC. Preparation of an Ag-TiO2 photocatalyst coated on activated carbon by MOCVD. Mater Chem Phys, 2005, 91(1): 73-79
13. Zhang XW, Zhou MH, Lei LC. Preparation of anatase TiO2 supported on alumina by different metal organic chemical vapor deposition methods. Appl Catal A-Gen, 2005, 282(1-2): 285-293
14. Zhang XW, Zhou MH, Lei LC. Enhancing the concentration of TiO2 photocatalyst on the extemal surface of activated carbon by MOCVD. Mater Res Bull, 2005, 40(11): 1899-1904
15. Ding Z, Hu XJ, Yue PL, Lu GQ, Greenfield PF. Synthesis of anatase TiO2 supported on porous solids by chemical vapor deposition. Catal Today, 2001, 68(1-3): 173-182
16. Evans P, Pemble ME, Sheel DW. Precursor-directed control of crystalline type in atmospheric pressure CVD growth of TiO2 on stainless steel. Chem Mater, 2006, 18(24): 5750-5755
17. Wu KR, Ting CH, Wang JJ, Liu WC, Lin CH. Characteristics of graded TiO2 and TiO2/ITO films prepared by twin DC magnetron sputtering technique. Surf Coat Technol, 2006, 200(20-21): 6030-6036
18. Dumitriu D, Bally AR, Ballif C, Hones P, Schmid PE, Sanjines R, Levy F, Parvulescu VI. Photocatalytic degradation of phenol by TiO2 thin films prepared by sputtering. Appl Catalysis B: Environ, 2000, 25(2-3): 83-92
19. Zhao GL, Utsumi S, Kozuka H, Yoko T. Photoelectrochemical properties of sol-gel-derived anatase and rutile TiO2 films. J Mater Sci, 1998, 33(14): 3655-3659
20. Waldner G, Pourmodjib M, Bauer R, Neumann-Spallart M. Photoelectrocatalytic degradation of 4-chlorophenol and oxalic acid on titanium dioxide electrodes. Chemosphere, 2003, 50(8): 989-998
21. Su YL, Zhang XW, Han S, Chen XQ, Lei LC. F-B-codoping of anodized TiO2 nanotubes using chemical vapor deposition. Electrochem Commun, 2007, 9(9): 2291-2298
22. Lei LC, Chu HP, Hu XJ, Yue PL. Preparation of heterogeneous photocatalyst (TiO2/alumina) by metallo-organic chemical vapor deposition. Ind Eng Chem Res, 1999, 38(9): 3381-3385
23. Zhang XW, Zhou MH, Lei LC. Co-deposition of photocatalytic Fe doped TiO2 coatings by MOCVD. Catalysis Commun, 2006, 7(7): 427-431
24. Zhang XW, Zhou MH, Lei LC. TiO2 photocatalyst deposition by MOCVD on activated carbon. Carbon, 2006, 44(2): 325-333
25. Duminica FD, Maury F, Senocq F. Atmospheric pressure MOCVD of TiO2 thin films using various reactive gas mixtures. Surf Coat Technol, 2004, 188-189: 255-259
26. Spurr RA, Myers H. Quantitative analysis of anatase-rutile mixtures with an X-ray diffractometer. Anal Chem, 1957, 29(5): 760-762
27. Furman P, Gluszek J, Masalski J. Titanium dioxide film obtained using the MOCVD method on 316L steel. J Mater Sci Lett, 1997, 16(6): 471-472
28. Lei L, Chu HP, Hu X, Yue PL. Preparation of heterogeneous photocatalyst (TiO2/alumina) by metallo-organic chemical vapor deposition. Ind Eng Chem Res, 1999, 38(9): 3381-3385
29. Li W, Shah SI, Huang CP, Jung O, Ni C. Metallorganic chemical vapor deposition and characterization of TiO2 nanoparticles. Mater Sci Engineer B-Solid State Mater for Adv Technol, 2002, 96(3): 247-253
30. Ohring M. The Materials Science of Thin Films. Boston: Academic Press, 1992
31. Kamata K, Maruyama K, Amano S, Fukazawa H. Rapid formation of TiO2 films by a conventional cvd method. J Mater Sci Lett, 1990, 9(3): 316-319