메뉴 건너뛰기




Volumn 117, Issue 6, 2013, Pages 1042-1052

Monohafnium oxide clusters HfOn- And HfOn (n = 1-6): Oxygen radicals, superoxides, peroxides, diradicals, and triradicals

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATED OXYGEN SPECIES; ANION PHOTOELECTRON SPECTROSCOPY; BOND ORDERS; DETACHMENT ENERGY; DIRADICALS; ELECTRONIC AND STRUCTURAL PROPERTIES; NEUTRAL CLUSTERS; OXIDE CLUSTERS; OXYGEN RADICAL; OXYGEN SPECIES; SUPEROXIDES; TRIRADICALS;

EID: 84871665893     PISSN: 10895639     EISSN: 15205215     Source Type: Journal    
DOI: 10.1021/jp302822p     Document Type: Article
Times cited : (24)

References (85)
  • 65
    • 0004062183 scopus 로고    scopus 로고
    • In; Jena, P. Khanna, S. N. Rao, B. K. World Scientific: Singapore - 300
    • Wang, L. S.; Li, X. In Clusters and Nanostructure Interfaces; Jena, P.; Khanna, S. N.; Rao, B. K., Eds.; World Scientific: Singapore, 2000; pp 293-300.
    • (2000) Clusters and Nanostructure Interfaces , pp. 293
    • Wang, L.S.1    Li, X.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.