Reactive-layer-assisted deposition mechanism and characterization of titanium oxide films

Langmuir

Volumn 28, Issue 49, 2012, Pages 17118-17123

  Zilberberg, Liat ^a   Asscher, Micha ^a  

^a HEBREW UNIVERSITY OF JERUSALEM   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; AMORPHOUS SOLID WATER; AMORPHOUS THIN FILMS; BUFFER MOLECULES; DEWETTING PROCESS; FILM FORMATIONS; FORMATION MECHANISM; GROWTH MECHANISMS; OXIDE LAYER; REACTIVE-LAYER-ASSISTED DEPOSITIONS; ROOM TEMPERATURE; TI ATOMS; TIO; TITANIUM ATOMS; ULTRAHIGH VACUUM CONDITIONS;

AMORPHOUS CARBON; DESORPTION; DEUTERIUM; MASS SPECTROMETRY; MOLECULES; MORPHOLOGY; SOL-GELS; TITANIUM; TITANIUM DIOXIDE;

OXIDE FILMS;

EID: 84870947831     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la302957q     Document Type: Article

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