Giant-amplitude, high-work density microactuators with phase transition activated nanolayer bimorphs

Nano Letters

Volumn 12, Issue 12, 2012, Pages 6302-6308

  Liu, Kai ^a,b   Cheng, Chun ^a   Cheng, Zhenting ^c   Wang, Kevin ^a,b   Ramesh, Ramamoorthy ^a,b   Wu, Junqiao ^a,b  

^a Lawrence Berkeley National Laboratory   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

actuator; bimorph; microfabrication; phase transition; Vanadium dioxide

Indexed keywords

ACTUATION MECHANISM; AQUEOUS CONDITION; ARTIFICIAL MUSCLE; BIMORPH; HIGH AMPLITUDES; HIGH DURABILITY; INTEGRATED DESIGNS; LENGTH SCALE; MANUFACTURABILITY; MECHANICAL MOTIONS; MICRO-SCALES; MICROFABRICATION PROCESS; NANO LAYERS; POTENTIAL APPLICATIONS; STRUCTURAL PHASE TRANSITION; THREE DIMENSIONAL GEOMETRY; VANADIUM DIOXIDE; WORK OUTPUT; WORKING ENVIRONMENT;

ACTUATORS; DRUG DELIVERY; ELECTROMECHANICAL DEVICES; MEMS; MICROANALYSIS; MICROFABRICATION; PHASE TRANSITIONS; VANADIUM;

MICROACTUATORS;

OXIDE; VANADIUM DERIVATIVE; VANADIUM DIOXIDE;

ARTICLE; CHEMISTRY; ELECTRICITY; EQUIPMENT; EQUIPMENT DESIGN; HEAT; LIGHT; MICROELECTROMECHANICAL SYSTEM; MICROTECHNOLOGY; PHASE TRANSITION; TRANSDUCER;

ELECTRICITY; EQUIPMENT DESIGN; HOT TEMPERATURE; LIGHT; MICRO-ELECTRICAL-MECHANICAL SYSTEMS; MICROTECHNOLOGY; OXIDES; PHASE TRANSITION; TRANSDUCERS; VANADIUM COMPOUNDS;

EID: 84870935009     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl303405g     Document Type: Article

References (30)

1. Mirfakhrai, T.; Madden, J. D. W.; Baughman, R. H. Mater. Today 2007, 10 (4) 30-38
2. Vaia, R.; Baur, J. Science 2008, 319 (5862) 420-421
3. Koerner, H.; White, T. J.; Tabiryan, N. V.; Bunning, T. J.; Vaia, R. A. Mater. Today 2008, 11 (7-8) 34-42
4. LeMieux, M. C.; McConney, M. E.; Lin, Y.-H.; Singamaneni, S.; Jiang, H.; Bunning, T. J.; Tsukruk, V. V. Nano Lett. 2006, 6 (4) 730-734
5. Zheng, L.-S.; Lu, M. S.-C. Sens. Actuators, A 2007, 136 (2) 697-703
6. Zhu, S.-E.; Shabani, R.; Rho, J.; Kim, Y.; Hong, B. H.; Ahn, J.-H.; Cho, H. J. Nano Lett. 2011, 11 (3) 977-981
7. Steel, M. R.; Harrison, F.; Harper, P. G. J. Phys. D: Appl. Phys. 1978, 11, 979-989
8. King, T. G.; Preston, M. E.; Murphy, B. J. M.; Cannell, D. S. Precis. Eng. 1990, 12, 131-136
9. Wu, C. C. M.; Kahn, M.; Moy, W. J. Am. Ceram. Soc. 1996, 79, 809-812
10. Wood, R. J.; Steltz, E.; Fearing, R. S. Sens. Actuators, A 2005, 119 (2) 476-488
11. Krulevitch, P.; Lee, A. P.; Ramsey, P. B.; Trevino, J. C.; Hamilton, J.; Northp, M. A. J. Microelectromech. Sys. 1996, 5, 270-282
12. Makino, E.; Mineta, T.; Mitsunaga, T.; Kawashima, T.; Shibata, T. Microelectron. Eng. 2011, 88 (8) 2662-2665
13. Baughman, R. H.; Cui, C.; Zakhidov, A. A.; Iqbal, Z.; Barisci, J. N.; Spinks, G. M.; Wallace, G. G.; Mazzoldi, A.; Rossi, D. D.; Rinzler, A. G.; Jaschinski, O.; Roth, S.; Kertesz, M. Science 1999, 284 (5418) 1340-1344
14. Landi, B. J.; Raffaelle, R. P.; Heben, M. J.; Alleman, J. L.; VanDerveer, W.; Gennett, T. Nano Lett. 2002, 2 (11) 1329-1332
15. Chen, L.; Liu, C.; Liu, K.; Meng, C.; Hu, C.; Wang, J.; Fan, S. ACS Nano 2011, 5 (3) 1588-1593
16. Li, J.; Ma, W.; Song, L.; Niu, Z.; Cai, L.; Zeng, Q.; Zhang, X.; Dong, H.; Zhao, D.; Zhou, W.; Xie, S. Nano Lett. 2011, 11 (11) 4636-4641
17. Zhang, X.; Pint, C. L.; Lee, M. H.; Schubert, B. E.; Jamshidi, A.; Takei, K.; Ko, H.; Gillies, A.; Bardhan, R.; Urban, J. J.; Wu, M.; Fearing, R.; Javey, A. Nano Lett. 2011, 11 (8) 3239-3244
18. Huber, J. E.; Fleck, N. A.; Ashby, M. F. Proc. Math. Phys. Eng. Sci. 1997, 453, 2185-2205
19. Zhang, Q. M.; Bharti, V.; Zhao, X. Science 1998, 280, 2101-2104
20. Wu, J.; Gu, Q.; Guiton, B. S.; de Leon, N. P.; Ouyang, L.; Park, H. Nano Lett. 2006, 6, 2313-2317
21. Cao, J.; Ertekin, E.; Srinivasan, V.; Fan, W.; Huang, S.; Zheng, H.; Yim, J. W. L.; Khanal, D. R.; Ogletree, D. F.; Grossman, J. C.; Wu, J. Nat. Nanotechnol. 2009, 4, 732-737
22. Wei, J.; Wang, Z.; Chen, W.; Cobden, D. H. Nat. Nanotechnol. 2009, 4, 420-424
23. Wall, S.; Wegkamp, D.; Foglia, L.; Appavoo, K.; Nag, J.; Haglund, R. F., Jr.; Stähler, J.; Wolf, M. Nat. Commun. 2012, 3, 721
24. Cao, J.; Fan, W.; Zhou, Q.; Sheu, E.; Liu, A.; Barrett, C.; Wu, J. J. Appl. Phys. 2010, 108 (8) 083538
25. Rúa, A.; Fernández, F. E.; Sepúlveda, N. J. Appl. Phys. 2010, 107 (7) 074506
26. Cabrera, R.; Merced, E.; Sepúlveda, N.; Fernández, F. E. J. Appl. Phys. 2011, 110 (9) 094510
27. Rivera, F.; Burk, L.; Davis, R.; Vanfleet, R. Thin Solid Films 2012, 520 (7) 2461-2466
28. Timoshenko, S. J. Opt. Soc. Am. 1925, 11, 233-255
29. Sershen, S. R.; Mensing, G. A.; Ng, M.; Halas, N. J.; Beebe, D. J.; West, J. L. Adv. Mater. 2005, 17, 1366-1368
30. Garcia-Cordero, J. L.; Kurzbuch, D.; Benito-Lopez, F.; Diamond, D.; Lee, L. P.; Ricco, A. J. Lab Chip 2010, 10 (20) 2680-2687