Properties of CuAlO2 thin films deposited by polyacrylamide gel route

Materials Science in Semiconductor Processing

Volumn 16, Issue 1, 2013, Pages 38-42

  Murali, K R ^a   Balasubramanian, M ^b  

^a CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE   (India)

^b University New Delhi India   (India)

Author keywords

CuAlO2; Sol gel; Thin films; Transparent conductor

Indexed keywords

ACRYLAMIDES; ANNEAL TEMPERATURES; ANNEALING TEMPERATURES; CLEAN GLASS SUBSTRATES; COATED FILMS; CUALO2; DIFFRACTION PEAKS; HALL MEASUREMENTS; LOW TEMPERATURES; P-TYPE CONDUCTIVITY; POLYACRYLAMIDE GELS; POST-ANNEAL; ROOT MEAN SQUARE VALUES; SMALL GRAINS; SOL-GEL DIP COATING TECHNIQUE; TRANSPARENT CONDUCTORS; XRD PATTERNS;

AMIDES; DEPOSITS; SOL-GELS; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION;

ANNEALING;

EID: 84870442468     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2012.07.001     Document Type: Article

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