Image simulation for atomic resolution secondary electron image

Ultramicroscopy

Volumn 123, Issue , 2012, Pages 66-73

  Wu, Lijun ^a   Egerton, R F ^b   Zhu, Yimei ^a  

^a BROOKHAVEN NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF ALBERTA   (Canada)

Author keywords

Aberration correction; Atomically resolved secondary electron imaging; Image simulation

Indexed keywords

ABERRATION CORRECTION; ADF-STEM; ATOMIC RESOLUTION; BULK STRUCTURE; DARK FIELD; ELECTRON INELASTIC MEAN FREE PATHS; EXPERIMENTAL OBSERVATION; HIGH SENSITIVITY; IMAGE CONTRASTS; IMAGE SIMULATIONS; INTENSITY DISTRIBUTION; MULTISLICE METHODS; OBJECT FUNCTIONS; SCANNING TRANSMISSION ELECTRON MICROSCOPES; SECONDARY ELECTRON IMAGES; SECONDARY ELECTRON IMAGING; SECONDARY ELECTRONS; SPECIMEN THICKNESS; SRTIO;

ATOMS; SECONDARY EMISSION; SURFACE STRUCTURE; TRANSMISSION ELECTRON MICROSCOPY;

CRYSTAL ATOMIC STRUCTURE;

ANALYTICAL PARAMETERS; ARTICLE; ATOMIC RESOLUTION SECONDARY ELECTRON IMAGE; ELECTRON; IMAGE ANALYSIS; IMAGE PROCESSING; LIGHT SCATTERING; MOLECULAR IMAGING; QUANTITATIVE ANALYSIS; SCANNING TRANSMISSION ELECTRON MICROSCOPY; SIMULATION; THICKNESS; COMPUTER SIMULATION; METHODOLOGY; PHONON; COMPLEX FORMATION; ELECTRON BEAM; FOURIER TRANSFORMATION; MICROSCOPE IMAGE; MOLECULAR SIZE; QUALITATIVE ANALYSIS; SECONDARY ELECTRON; SIGNAL NOISE RATIO; STATIC ELECTRICITY;

COMPUTER SIMULATION; ELECTRONS; MICROSCOPY, ELECTRON, SCANNING TRANSMISSION; PHONONS;

EID: 84870441625     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2012.06.008     Document Type: Article

References (22)

1. Zhu Y., Inada H., Nakamura K., Wall J. Nature Materials 2009, 8:808.
2. Joy D.C. Nature Materials 2009, 8:776.
3. Inada H., Su D., Egerton R.F., Konno M., Wu L., Ciston J., Wall J., Zhu Y. Ultramicroscopy 2011, 111:12.
4. Ramachandra R., Griffin B., Joy D. Ultramicroscopy 2009, 109:748.
5. Bohr N. Philosophical Magazine 1913, 25:1.
6. Muller D.A., Silcox J. Ultramicroscopy 1995, 59:195.
7. Egerton R.F. Electron Energy-Loss Spectroscopy in the Electron Microscope 2011, Springer. 3rd ed.
8. Maslen V.W., Rossouw C.J. Philosophical Magazine A 1983, 47:119.
9. Kohl H., Rose H. Advances in Imaging and Electron Physics 1985, 65:173.
10. Findlay S.D., Oxley M.P., Pennycook S.J., Allen L.J. Ultramicroscopy 2005, 104:126.
11. Cosgriff E.C., Oxley M.P., Allen L.J., Pennycook S.J. Ultramicroscopy 2005, 102:317.
12. Xin H.L., Kourkoutis L.F., Mundy J.A., Zheng H., Muller D.A. Microscopy and Microanalysis 2010, 16(Suppl. 2):242.
13. Shuman H., Chang C.F., Somlyo A.P. Ultramicroscopy 1986, 19:121.
14. Egerton R.F. Ultramicroscopy 2007, 107:575.
15. Zhou W., Pennycook S.J., Idrobo J.C. Ultramicroscopy 2012, 119:51.
16. Koppe H. Zeitschrift Fur Physik 1948, 124:658.
17. Lenz F. Zeitschrift Fur Naturforschung Section A 1954, 9:185.
18. Kirkland E.J. Advanced Computing in Electron Microscopy 1998, Plenum Press.
19. Haider M., Uhlemann S., Zach J. Ultramicroscopy 2000, 81:163.
20. LeBeau J.M., Findlay S.D., Allen L.J., Stemmer S. Physical Review Letters 2008, 100:206101.
21. Inada H., Wu L.J., Wall J., Su D., Zhu Y.M. Journal of Electron Microscopy 2009, 58:111.
22. Klenov D.O., Findlay S.D., Allen L.J., Stemmer S. Physical Review B 2007, 76:014111.