Effect of growth rate and thickness on kinetic roughening and multifractal properties of electrodeposited Ni thin films

Surface Engineering

Volumn 28, Issue 9, 2012, Pages 667-673

  Hedayati, K ^a   Nabiyouni, G ^a   Jafari, G R ^b,c  

^a ARAK UNIVERSITY   (Iran)

^b SHAHID BEHESHTI UNIVERSITY   (Iran)

^c INSTITUTE FOR STUDIES IN THEORETICAL PHYSICS AND MATHEMATICS IPM   (Iran)

Author keywords

AFM; Electrodeposition; MF DFA; Ni films

Indexed keywords

AFM; ATOMIC FORCE; DEPOSITION CURRENT DENSITY; DEPOSITION TIME; FRACTALITY; KINETIC ROUGHENING; LONG RANGE CORRELATIONS; MF-DFA; MULTI-FRACTAL PROPERTY; MULTIFRACTAL DETRENDED FLUCTUATION ANALYSIS; NI FILMS; NI THIN FILMS; ORIGINAL SERIES; PARTITION FUNCTIONS; SCALING EXPONENT; SINGULARITY SPECTRUM; STATISTICAL PROPERTIES; STOCHASTIC ANALYSIS;

ATOMIC FORCE MICROSCOPY; DEPOSITION; ELECTRODEPOSITION; FRACTAL DIMENSION; PROBABILITY DENSITY FUNCTION; SURFACE ROUGHNESS; THIN FILMS;

VAPOR DEPOSITION;

EID: 84869047792     PISSN: 02670844     EISSN: 17432944     Source Type: Journal    
DOI: 10.1179/1743294412Y.0000000048     Document Type: Article

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