Enhancing the stability of CuO thin-film photoelectrodes by Ti alloying

Journal of Electronic Materials

Volumn 41, Issue 11, 2012, Pages 3062-3067

  Tang, Houwen ^a   Matin, M A ^b   Wang, Heli ^a   Sudhakar, Shet ^a   Chen, Le ^a   Al Jassim, Mowafak M ^a   Yan, Yanfa ^c  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^b University of Denver   (United States)

^c UNIVERSITY OF TOLEDO   (United States)

Author keywords

Bilayer; CuO; Sputtering; Ti alloy

Indexed keywords

BI-LAYER; CRYSTALLINITIES; CUO; PHOTO-ELECTRODES; PHOTOELECTROCHEMICALS; TI ALLOYS; WATER SPLITTING;

ALLOYING; PHOTOCURRENTS; SPUTTERING; TITANIUM ALLOYS;

STABILITY;

EID: 84868520300     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-012-2194-3     Document Type: Article

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