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Physics of Plasmas

Volumn 19, Issue 10, 2012, Pages

Open-air direct current plasma jet: Scaling up, uniformity, and cellular control

(5) Wu, S a Wang, Z a Huang, Q a Lu, X a Ostrikov, K a,b,c

a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY (China)

b CSIRO (Australia)

c UNIVERSITY OF SYDNEY (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

AIR PLASMAS; ATMOSPHERIC PRESSURE PLASMA JETS; CELLULAR CONTROL; COLD AIR; DIRECT CURRENT PLASMAS; DIRECT CURRENT POWER SUPPLY; GLOW-TO-ARC TRANSITION; HEK-293; HUMAN EMBRYONIC KIDNEYS; INNER SURFACES; PLASMA GLOW; PLASMA PROPERTIES; PLASMA UNIFORMITY; QUARTZ TUBES; RESIDUAL CHARGE; SCALING-UP; SPATIALLY RESOLVED OPTICAL EMISSION;

EMISSION SPECTROSCOPY; NOZZLES; PLASMA JETS; PLASMAS; THERMAL PLUMES; TUBES (COMPONENTS);

ELECTRIC DISCHARGES;

EID: 84868380117 PISSN: 1070664X EISSN: None Source Type: Journal
DOI: 10.1063/1.4762858 Document Type: Article

Times cited : (32)

References (30)

1
- 23044455785
- 10.1002/ppa200400078
- M. Laroussi, Plasma Processes Polym. 2, 391 (2005). 10.1002/ppap. 200400078
- (2005) Plasma Processes Polym. , vol.2 , pp. 391
- Laroussi, M.¹

2
- 72049111528
- 10.1088/1367-2630/11/11/115012
- M. Kong, G. Kroesen, G. Morfill, T. Nosenko, T. Shimizu, J. Dijk, and J. Zimmermann, New J. Phys. 11, 115012 (2009). 10.1088/1367-2630/11/11/115012
- (2009) New J. Phys. , vol.11 , pp. 115012
- Kong, M.¹ Kroesen, G.² Morfill, G.³ Nosenko, T.⁴ Shimizu, T.⁵ Dijk, J.⁶ Zimmermann, J.⁷

3
- 79954603486
- 10.1088/0022-3727/44/17/174014
- U. Cvelbar, J. Phys. D: Appl. Phys. 44, 174014 (2011). 10.1088/0022-3727/44/17/174014
- (2011) J. Phys. D: Appl. Phys. , vol.44 , pp. 174014
- Cvelbar, U.¹

4
- 79961143557
- 10.1063/1.3614538
- A. Shashurin, J. Li, T. Zhuang, M. Keidar, and I. I. Beilis, Phys. Plasmas 18, 073505 (2011). 10.1063/1.3614538
- (2011) Phys. Plasmas , vol.18 , pp. 073505
- Shashurin, A.¹ Li, J.² Zhuang, T.³ Keidar, M.⁴ Beilis, I.I.⁵

5
- 33750588833
- 10.1088/0963-0252/15/4/S03
- E. Stoffels, I. Kieft, R. Sladek, L. Bedem, E. Laan, and M. Steinbuch, Plasma Sources Sci. Technol. 15, S169 (2006). 10.1088/0963-0252/15/4/S03
- (2006) Plasma Sources Sci. Technol. , vol.15 , pp. 169
- Stoffels, E.¹ Kieft, I.² Sladek, R.³ Bedem, L.⁴ Laan, E.⁵ Steinbuch, M.⁶

6
- 45749102465
- 10.1063/1.2940325
- J. Kolb, A. Mohamed, R. Price, R. Swanson, A. Bowman, R. Chiavarini, M. Stacey, and K. Schoenbach, Appl. Phys. Lett. 92, 241501 (2008). 10.1063/1.2940325
- (2008) Appl. Phys. Lett. , vol.92 , pp. 241501
- Kolb, J.¹ Mohamed, A.² Price, R.³ Swanson, R.⁴ Bowman, A.⁵ Chiavarini, R.⁶ Stacey, M.⁷ Schoenbach, K.⁸

7
- 51849157324
- 10.1063/1.2977674
- X. P. Lu, T. Ye, Y. G. Cao, Z. Y. Sun, Q. Xiong, Z. Y. Tang, Z. L. Xiong, J. Hu, Z. H. Jiang, and Y. Pan, J. Appl. Phys. 104, 053309 (2008). 10.1063/1.2977674
- (2008) J. Appl. Phys. , vol.104 , pp. 053309
- Lu, X.P.¹ Ye, T.² Cao, Y.G.³ Sun, Z.Y.⁴ Xiong, Q.⁵ Tang, Z.Y.⁶ Xiong, Z.L.⁷ Hu, J.⁸ Jiang, Z.H.⁹ Pan, Y.¹⁰

8
- 34247522927
- 10.1109/TPS.2006.888587
- P. K. Chu, IEEE Trans. Plasma Sci. 35, 181 (2007). 10.1109/TPS.2006. 888587
- (2007) IEEE Trans. Plasma Sci. , vol.35 , pp. 181
- Chu, P.K.¹

9
- 77956991352
- 10.1088/0022-3727/43/32/323001
- D. Mariotti and R. M. Sankaran, J. Phys. D: Appl. Phys. 43, 323001 (2010). 10.1088/0022-3727/43/32/323001
- (2010) J. Phys. D: Appl. Phys. , vol.43 , pp. 323001
- Mariotti, D.¹ Sankaran, R.M.²

10
- 52349092422
- 10.1063/1.2982497
- J. L. Walsh and M. G. Kong, Appl. Phys. Lett. 93, 111501 (2008). 10.1063/1.2982497
- (2008) Appl. Phys. Lett. , vol.93 , pp. 111501
- Walsh, J.L.¹ Kong, M.G.²

11
- 24944572288
- 10.1063/1.2045549
- M. Laroussi and X. Lu, Appl. Phys. Lett. 87, 113902 (2005). 10.1063/1.2045549
- (2005) Appl. Phys. Lett. , vol.87 , pp. 113902
- Laroussi, M.¹ Lu, X.²

12
- 47249154736
- 10.1063/1.2956411
- Q. Y. Nie, D. Z. Wang, C. S. Ren, and J. L. Zhang, Appl. Phys. Lett. 93, 011503 (2008). 10.1063/1.2956411
- (2008) Appl. Phys. Lett. , vol.93 , pp. 011503
- Nie, Q.Y.¹ Wang, D.Z.² Ren, C.S.³ Zhang, J.L.⁴

13
- 42349085395
- 10.1063/1.2912524
- X. Lu, Z. Jiang, Q. Xiong, Z. Tang, and Y. Pan, Appl. Phys. Lett. 92, 151504 (2008). 10.1063/1.2912524
- (2008) Appl. Phys. Lett. , vol.92 , pp. 151504
- Lu, X.¹ Jiang, Z.² Xiong, Q.³ Tang, Z.⁴ Pan, Y.⁵

14
- 58349088805
- 10.1063/1.3069276
- Z. Cao, J. Walsh, and M. G. Kong, Appl. Phys. Lett. 94, 021501 (2009). 10.1063/1.3069276
- (2009) Appl. Phys. Lett. , vol.94 , pp. 021501
- Cao, Z.¹ Walsh, J.² Kong, M.G.³

15
- 81255149364
- 10.1109/TPS.2011.2128890
- X. Pei, Z. Wang, Q. Huang, S. Wu, and X. Lu, IEEE Trans. Plasma Sci. 39, 2276 (2011). 10.1109/TPS.2011.2128890
- (2011) IEEE Trans. Plasma Sci. , vol.39 , pp. 2276
- Pei, X.¹ Wang, Z.² Huang, Q.³ Wu, S.⁴ Lu, X.⁵

16
- 79951910380
- 10.1063/1.3555434
- K. Kim, J. Choi, Y. Hong, G. Kim, E. Noh, J. Lee, and S. Yang, Appl. Phys. Lett. 98, 073701 (2011). 10.1063/1.3555434
- (2011) Appl. Phys. Lett. , vol.98 , pp. 073701
- Kim, K.¹ Choi, J.² Hong, Y.³ Kim, G.⁴ Noh, E.⁵ Lee, J.⁶ Yang, S.⁷

17
- 31144475911
- 10.1088/0022-3727/39/3/R01
- K. H. Becker, K. H. Schoenbach, and J. G. Eden, J. Phys. D: Appl. Phys. 39, R55 (2006). 10.1088/0022-3727/39/3/R01
- (2006) J. Phys. D: Appl. Phys. , vol.39 , pp. 55
- Becker, K.H.¹ Schoenbach, K.H.² Eden, J.G.³

18
- 21644448003
- (IOP, Bristol, UK).
- K. H. Becker, U. Kogelschatz, K. H. Schoenbach, and R. J. Barker, Nonequilibrium Air Plasmas at Atmospheric Pressure (IOP, Bristol, UK, 2005).
- (2005) Nonequilibrium Air Plasmas at Atmospheric Pressure
- Becker, K.H.¹ Kogelschatz, U.² Schoenbach, K.H.³ Barker, R.J.⁴

19
- 43149083471
- 10.1088/0963-0252/17/2/025013
- D. Staack, B. Farouk, A. Gutsol, and A. Fridman, Plasma Sources Sci. Technol. 17, 025013 (2008). 10.1088/0963-0252/17/2/025013
- (2008) Plasma Sources Sci. Technol. , vol.17 , pp. 025013
- Staack, D.¹ Farouk, B.² Gutsol, A.³ Fridman, A.⁴

20
- 27744600089
- 10.1088/0963-0252/14/4/009
- D. Staack, B. Farouk, A. Gutsol, and A. Fridman, Plasma Sources Sci. Technol. 14, 700 (2005). 10.1088/0963-0252/14/4/009
- (2005) Plasma Sources Sci. Technol. , vol.14 , pp. 700
- Staack, D.¹ Farouk, B.² Gutsol, A.³ Fridman, A.⁴

21
- 78650196691
- 10.1109/TPS.2010.2082571
- S. Wu, X. Lu, Z. Xiong, and Y. Pan, IEEE Trans. Plasma Sci. 38, 3404 (2010). 10.1109/TPS.2010.2082571
- (2010) IEEE Trans. Plasma Sci. , vol.38 , pp. 3404
- Wu, S.¹ Lu, X.² Xiong, Z.³ Pan, Y.⁴

22
- 0038037800
- 10.1088/0022-3727/36/11/308
- I. Radu, R. Bartnikas, and M. R. Wertheimer, J. Phys. D: Appl. Phys. 36, 1284 (2003). 10.1088/0022-3727/36/11/308
- (2003) J. Phys. D: Appl. Phys. , vol.36 , pp. 1284
- Radu, I.¹ Bartnikas, R.² Wertheimer, M.R.³

23
- 0037150101
- 10.1088/0022-3727/35/8/306
- Y. B. Golubovskii, V. Maiorov, and J. F. Behnke, J. Phys. D: Appl. Phys. 35, 751 (2002). 10.1088/0022-3727/35/8/306
- (2002) J. Phys. D: Appl. Phys. , vol.35 , pp. 751
- Golubovskii, Y.B.¹ Maiorov, V.² Behnke, J.F.³

24
- 38549137292
- 10.1063/1.2838340
- M. Li, C. Li, H. Zhan, J. Xu, and X. Wang, Appl. Phys. Lett. 92, 031503 (2008). 10.1063/1.2838340
- (2008) Appl. Phys. Lett. , vol.92 , pp. 031503
- Li, M.¹ Li, C.² Zhan, H.³ Xu, J.⁴ Wang, X.⁵

25
- 79958801946
- 10.1109/TPS.2011.2132152
- S. Wu, Z. Wang, Q. Huang, X. Lu, and Y. Pan, IEEE Trans. Plasma Sci. 39, 1489 (2011). 10.1109/TPS.2011.2132152
- (2011) IEEE Trans. Plasma Sci. , vol.39 , pp. 1489
- Wu, S.¹ Wang, Z.² Huang, Q.³ Lu, X.⁴ Pan, Y.⁵

26
- 0018877140
- J. I. Levatter and S. C. Lin, J. Appl. Phys. 51, 210 (1979).
- (1979) J. Appl. Phys. , vol.51 , pp. 210
- Levatter, J.I.¹ Lin, S.C.²

27
- 79960591683
- 10.1103/PhysRevE.83.046405
- Q. Li, Y. K. Pu, M. A. Lieberman, and D. J. Economou, Phys. Rev. E 83, 046405 (2011). 10.1103/PhysRevE.83.046405
- (2011) Phys. Rev. e , vol.83 , pp. 046405
- Li, Q.¹ Pu, Y.K.² Lieberman, M.A.³ Economou, D.J.⁴

28
- 70349487384
- 10.1063/1.3232210
- S. Xu, I. Levchenko, S. Y. Huang, and K. Ostrikov, Appl. Phys. Lett. 95, 111505 (2009). 10.1063/1.3232210
- (2009) Appl. Phys. Lett. , vol.95 , pp. 111505
- Xu, S.¹ Levchenko, I.² Huang, S.Y.³ Ostrikov, K.⁴

29
- 0037205354
- 10.1016/S0928-4931(02)00029-2
- J. D. Long, S. Xu, J. W. Cai, N. Jiang, J. H. Lu, K. N. Ostrikov, and C. H. Diong, Mater. Sci. Eng., C 20, 175 (2002). 10.1016/S0928-4931(02)00029-2
- (2002) Mater. Sci. Eng., C , vol.20 , pp. 175
- Long, J.D.¹ Xu, S.² Cai, J.W.³ Jiang, N.⁴ Lu, J.H.⁵ Ostrikov, K.N.⁶ Diong, C.H.⁷

30
- 77957911045
- 10.1039/c0nr00366b
- K. Ostrikov, I. Levchenko, U. Cvelbar, M. K. Sunkara, and M. Mozetic, Nanoscale 2, 2012 (2010). 10.1039/c0nr00366b
- (2010) Nanoscale , vol.2 , pp. 2012
- Ostrikov, K.¹ Levchenko, I.² Cvelbar, U.³ Sunkara, M.K.⁴ Mozetic, M.⁵

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