PLD deposited Al2O3 thin films for transparent electronics

Digest Journal of Nanomaterials and Biostructures

Volumn 7, Issue 4, 2012, Pages 1609-1614

  Ion, M ^a,b   Berbecaru, C ^a   Iftimie, S ^a   Filipescu, M ^c   Dinescu, M ^c   Antohe, S ^a,d  

^a UNIVERSITY OF BUCHAREST   (Romania)

^b NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

^c NATIONAL INSTITUTE FOR LASER   (Romania)

^d Development in Physics and Nuclear Engineering   (Romania)

Author keywords

Alumina thin films; Dielectric properties; Pulsed Laser Deposition

Indexed keywords

EID: 84868094164     PISSN: None     EISSN: 18423582     Source Type: Journal    
DOI: None     Document Type: Article

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