Preparation of high-quality colloidal mask for nanosphere lithography by a combination of air/water interface self-assembly and solvent vapor annealing

Langmuir

Volumn 28, Issue 34, 2012, Pages 12681-12689

  Yu, Jie ^a   Geng, Chong ^a   Zheng, Lu ^a   Ma, Zhaohui ^b   Tan, Tianya ^b   Wang, Xiaoqing ^a   Yan, Qingfeng ^a   Shen, Dezhong ^a  

^a TSINGHUA UNIVERSITY   (China)

^b LIAONING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AIR/WATER INTERFACES; CATALYTIC PROPERTIES; COLLOIDAL MASKS; COLLOIDAL MONOLAYERS; COLLOIDAL SPHERE; FEATURE SIZES; FLEXIBLE CONTROL; HIGH QUALITY; HIGH-QUALITY LATEX; HIGH-THROUGHPUT; NANO SPHERE LITHOGRAPHY; NANOPARTICLE ARRAY; SELF-ASSEMBLY METHOD; SOLVENT VAPORS;

ANNEALING; FABRICATION; LITHOGRAPHY; MONOLAYERS; NANOPARTICLES; NANOSPHERES; SELF ASSEMBLY; SOLVENTS;

VAPORS;

EID: 84867535116     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la3026182     Document Type: Article

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