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Materials Chemistry and Physics

Volumn 136, Issue 2-3, 2012, Pages 1067-1072

Characterization of nanostructured Mn 3O 4 thin films grown by SILAR method at room temperature

(6) Ubale, A U a Belkhedkar, M R b Sakhare, Y S a Singh, Arvind c Gurada, Chetan c Kothari, D C c

a GOVERNMENT VIDARBHA INSTITUTE OF SCIENCE AND HUMANITIES (India)

b SHRI SHIVAJI SCIENCE COLLEGE (India)

c UNIVERSITY OF MUMBAI (India)

Author keywords

AFM; Electrical properties; Nanostructures; Optical properties; Thin films

Indexed keywords

AFM; AS-DEPOSITED FILMS; ELECTRICAL RESISTIVITY MEASUREMENTS; FIELD EMISSION SCANNING; FOURIER TRANSFORM INFRARED SPECTRUMS; GLASS SUBSTRATES; MORPHOLOGICAL CHARACTERIZATION; NANO-STRUCTURED; P-TYPE; ROOM TEMPERATURE; SILAR METHOD; SUCCESSIVE IONIC LAYER ADSORPTION AND REACTIONS; TRANSPARENT THIN FILM;

ACTIVATION ENERGY; ADSORPTION; DEPOSITS; ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; NANOSTRUCTURES; OPTICAL BAND GAPS; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

MANGANESE;

EID: 84867401788 PISSN: 02540584 EISSN: None Source Type: Journal
DOI: 10.1016/j.matchemphys.2012.08.052 Document Type: Article

Times cited : (31)

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