Electric contact resistance for monitoring nanoindentation-induced delamination

Advances in Natural Sciences: Nanoscience and Nanotechnology

Volumn 2, Issue 1, 2011, Pages

  Nguyen, Huu Hung ^a   Wei, Pal Jen ^a   Lin, Jen Fin ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Contact resistance; Nano indentation

Indexed keywords

CONTACT RESISTANCE; DROPS; ELECTRIC CONTACTS; UNLOADING;

CONTACT CURRENTS; CONTACT DEPTH; INDENTATION DEPTH; INDENTATION LOAD; INTERFACIAL CONTACT; UNLOADING PROCESS;

NANOINDENTATION;

EID: 84867329896     PISSN: None     EISSN: 20436262     Source Type: Journal    
DOI: 10.1088/2043-6262/2/1/015007     Document Type: Article

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