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Volumn 90, Issue 5, 2012, Pages 259-266

Chemometrics applied to functional chromium electroplating by pulse plating techniques

Author keywords

Chemometrics; Chromium; Multivariate; Principal components; Reverse pulse plating

Indexed keywords

CHEMOMETRIC APPROACH; CHEMOMETRICS; CHROMIUM COATINGS; CHROMIUM ELECTROPLATING; CRACK FREE; DIRECT CURRENT; EFFECT OF PULSE; ELECTRODEPOSITED COATINGS; ELECTRODEPOSITION PROCESS; ENGINEERING APPLICATIONS; FUNCTIONAL COATING; HARDNESS VALUES; LOW CURRENTS; MECHANICAL AND TRIBOLOGICAL PROPERTIES; MULTI VARIATE ANALYSIS; MULTIVARIATE; OPERATING PARAMETERS; PHYSICAL CHARACTERISTICS; PRINCIPAL COMPONENTS; PULSE ELECTRODEPOSITION; PULSE PARAMETER; PULSE PLATING; REVERSE PULSE PLATING;

EID: 84867156838     PISSN: 00202967     EISSN: 17459192     Source Type: Journal    
DOI: 10.1179/0020296712Z.00000000046     Document Type: Article
Times cited : (16)

References (28)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.