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Volumn 90, Issue 5, 2012, Pages 259-266
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Chemometrics applied to functional chromium electroplating by pulse plating techniques
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Author keywords
Chemometrics; Chromium; Multivariate; Principal components; Reverse pulse plating
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Indexed keywords
CHEMOMETRIC APPROACH;
CHEMOMETRICS;
CHROMIUM COATINGS;
CHROMIUM ELECTROPLATING;
CRACK FREE;
DIRECT CURRENT;
EFFECT OF PULSE;
ELECTRODEPOSITED COATINGS;
ELECTRODEPOSITION PROCESS;
ENGINEERING APPLICATIONS;
FUNCTIONAL COATING;
HARDNESS VALUES;
LOW CURRENTS;
MECHANICAL AND TRIBOLOGICAL PROPERTIES;
MULTI VARIATE ANALYSIS;
MULTIVARIATE;
OPERATING PARAMETERS;
PHYSICAL CHARACTERISTICS;
PRINCIPAL COMPONENTS;
PULSE ELECTRODEPOSITION;
PULSE PARAMETER;
PULSE PLATING;
REVERSE PULSE PLATING;
CHROMIUM;
CORROSION RESISTANCE;
DEPOSITS;
MECHANICAL PROPERTIES;
METAL COATINGS;
PROTECTIVE COATINGS;
ELECTROPLATING;
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EID: 84867156838
PISSN: 00202967
EISSN: 17459192
Source Type: Journal
DOI: 10.1179/0020296712Z.00000000046 Document Type: Article |
Times cited : (16)
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References (28)
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