Prediction of advanced oxidation performance in various pilot UV/H2O2 reactor systems with MP- and LP- and DBD-UV lamps

Chemical Engineering Journal

Volumn 210, Issue , 2012, Pages 520-528

  Hofman Caris, Roberta C H M ^a   Harmsen, Danny J H ^a   Beerendonk, Erwin F ^a   Knol, Ton H ^b   Houtman, Corine J ^c   Metz, Deborah H ^d   Wols, Bas A ^a  

^a KWR WATERCYCLE RESEARCH INSTITUTE   (Netherlands)

^b Dunea   (Netherlands)

^c Het Waterlaboratorium   (Netherlands)

^d Greater Cincinnati Waterworks (GCWW)   (United States)

Author keywords

Advanced oxidation; Prediction models; Reactor geometry; UV; UV lamps

Indexed keywords

COMPUTATIONAL FLUID DYNAMICS; DIELECTRIC DEVICES; DIELECTRIC MATERIALS; EMISSION SPECTROSCOPY; FORECASTING; KINETIC PARAMETERS; KINETIC THEORY; MATRIX ALGEBRA; OXIDATION; PHOTOLYSIS; POTABLE WATER; ULTRAVIOLET LAMPS; WATER POLLUTION; WATER TREATMENT;

ADVANCED OXIDATION; ADVANCED OXIDATION PROCESSES; DIELECTRIC BARRIER DISCHARGES; DOSE-RESPONSE CURVES; ORGANIC MICRO-POLLUTANTS; PREDICTION MODEL; PURIFICATION PROCESS; REACTOR GEOMETRIES;

PREDICTIVE ANALYTICS;

EID: 84867047333     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2012.09.041     Document Type: Article

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