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Volumn 44, Issue 16, 2010, Pages 6233-6241

Modeling hydroxyl radical distribution and trialkyl phosphates oxidation in UV - H2O2 photoreactors using computational fluid dynamics

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED OXIDATION PROCESS; CFD SIMULATIONS; COST-EFFECTIVE SOLUTIONS; CROSS FLOWS; DIFFUSION CONTROLLED REACTIONS; DOSE DISTRIBUTIONS; EXPERIMENTAL DATA; HYDROXYL RADICALS; KINETIC MODELING; KINETIC MODELS; LAMINAR FLOW REGIMES; PHOTOCHEMICAL PROCESS; PHOTOREACTORS; REACTOR ENGINEERING; RECIRCULATION ZONES; REYNOLDS-AVERAGED NAVIER-STOKES EQUATIONS; SPATIAL VISUALIZATION; TRIALKYL PHOSPHATE; TRIBUTYL PHOSPHATE; ULTRA-VIOLET LIGHT; UV DOSE; UV LAMPS; WATER AND WASTEWATER TREATMENTS;

EID: 77956533355     PISSN: 0013936X     EISSN: 15205851     Source Type: Journal    
DOI: 10.1021/es1000962     Document Type: Article
Times cited : (54)

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