Mid-infrared optical properties of thin films of aluminum oxide, titanium dioxide, silicon dioxide, aluminum nitride, and silicon nitride

Applied Optics

Volumn 51, Issue 28, 2012, Pages 6789-6798

  Kischkat, Jan ^a   Peters, Sven ^b   Gruska, Bernd ^b   Semtsiv, Mykhaylo ^a   Chashnikova, Mikaela ^a   Klinkmüller, Matthias ^a   Fedosenko, Oliana ^a   MacHulik, Stephan ^a   Aleksandrova, Anna ^a   Monastyrskyi, Gregorii ^a   Flores, Yuri ^a   Masselink, W Ted ^a  

^a HUMBOLDT UNIVERSITY   (Germany)

^b SENTECH INSTRUMENTS GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ALUMINUM NITRIDE; DIELECTRIC MATERIALS; FILMS; INFRARED DEVICES; NITRIDES; OPTICAL COATINGS; OPTICAL PROPERTIES; OXIDE FILMS; OXIDES; REACTIVE SPUTTERING; REFRACTIVE INDEX; SILICON NITRIDE; SILICON OXIDES; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS; TITANIUM; TITANIUM NITRIDE; TITANIUM OXIDES;

ALUMINUM OXIDES; COMPLEX REFRACTIVE INDEX; DEGREE OF AMORPHOUSNESS; ELECTROMAGNETIC SPECTRA; GROWTH CONDITIONS; INDEX OF REFRACTION; INFORMATION BASE; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY;

ALUMINUM COATINGS;

EID: 84866994874     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.51.006789     Document Type: Article

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