Modeling the chemical kinetics of atmospheric plasma for cell treatment in a liquid solution

Physics of Plasmas

Volumn 19, Issue 7, 2012, Pages

  Kim, H Y ^a   Lee, H W ^b   Kang, S K ^a   Lee, H Wk ^a   Kim, G C ^b,c   Lee, J K ^a,b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Medipl Corporation   (South Korea)

^c Pusan National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CYTOLOGY; LIQUIDS; TEMPERATURE;

AIR CONCENTRATIONS; ATMOSPHERIC PLASMAS; ATMOSPHERIC PRESSURE PLASMAS; CELL INACTIVATION; GLOBAL MODELING; LIQUID SOLUTION; LOW TEMPERATURES; PLASMA EXPOSURE;

CELLS;

EID: 84866949184     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4739777     Document Type: Article

References (31)

1. F. Iza, G. J. Kim, S. M. Lee, J. K. Lee, J. L. Walsh, Y. T. Zhang, and M. G. Kong, Plasma Processes Polym. 5, 322-344 (2008). 10.1002/ppap.200700162
2. G. Y. Park, S. J. Park, M. Y. Choi, I. G. Koo, J. H. Byun, J. W. Hong, J. Y. Sim, G. J. Collins, and J. K. Lee, Plasma Sources Sci. Technol. 21, 043001 (2012). 10.1088/0963-0252/21/4/043001
3. G. C. Kim, G. J. Kim, S. R. Park, S. M. Jeon, H. J. Seo, F. Iza, and J. K. Lee, J. Phys. D: Appl. Phys. 42, 032005 (2009). 10.1088/0022-3727/42/3/032005
4. G. J. Kim, W. Kim, K. T. Kim, and J. K. Lee, Appl. Phys. Lett. 96, 021502 (2010). 10.1063/1.3292206
5. H. J. Lee, C. H. Shon, Y. S. Kim, S. Kim, G. C. Kim, and M. G. Kong, New J. Phys. 11, 115026 (2009). 10.1088/1367-2630/11/11/115026
6. M. Laroussi, Plasma Processes Polym. 2, 391 (2005). 10.1002/ppap. 200400078
7. S. K. Kang, M. Y. Choi, I. G. Koo, P. Y. Kim, Y. Kim, G. J. Kim, A. A. Mohamed, G. J. Collins, and J. K. Lee, Appl. Phys. Lett. 98, 143702 (2011). 10.1063/1.3574639
8. G. Fridman, G. Friedman, A. Gutsol, A. B. Shekhter, V. N. Vasilets, and A. Fridman, Plasma Processes Polym. 5, 503 (2008). 10.1002/ppap.200700154
9. S. U. Kalghatgi, G. Fridman, M. Cooper, G. Nagaraj, M. Peddinghaus, M. Balasubramanian, V. N. Vasilets, A. F. Gutsol, A. Fridman, and G. Friedman, IEEE Trans. Plasma Sci. 35, 1559 (2007). 10.1109/TPS.2007.905953
10. W. Kim, K. C. Woo, G. C. Kim, and K. T. Kim, J. Phys. D: Appl. Phys. 44, 013001 (2011). 10.1088/0022-3727/44/1/013001
11. D. Dobrynin, G. Fridman, G. Friedman, and A. Fridman, New J. Phys. 11, 115020 (2009). 10.1088/1367-2630/11/11/115020
12. G. Fridman, A. Shereshevsky, M. M. Jost, A. D. Brooks, A. Fridman, G. Alexander, and G. Friedman, Plasma Chem. Plasma Process. 27, 163-176 (2007). 10.1007/s11090-007-9048-4
13. S. Ikawa, K. Kitano, and S. Hamaguchi, Plasma Processes Polym. 7, 33-42 (2010). 10.1002/ppap.200900090
14. H. Yamazaki, T. Ohshima, Y. Tsubota, H. Yamaguchi, J. A. Jayawardena, and Y. Nishimura, Dent. Mater. J. 30, 384-391 (2011). 10.4012/dmj.2010-190
15. H. W. Lee, G. Y. Park, Y. S. Seo, Y. H. Im, S. B. Shim, and H. J. Lee, J. Phys. D: Appl. Phys. 44, 053001 (2011). 10.1088/0022-3727/44/5/053001
16. S. M. Lee, Y. J. Hong, Y. S. Seo, F. Iza, G. C. Kim, and J. K. Lee, Comput. Phys. Commun. 180, 636-641 (2009). 10.1016/j.cpc.2009.01.004
17. G. Y. Park, Y. J. Hong, H. W. Lee, J. Y. Sim, and J. K. Lee, Plasma Processes Polym. 7, 281-287 (2010). 10.1002/ppap.200900084
18. G. Y. Park, H. W. Lee, G. C. Kim, and J. K. Lee, Plasma Processes Polym. 5, 569-576 (2008). 10.1002/ppap.200800019
19. D. X. Liu, P. Bruggeman, F. Iza, M. Z. Rong, and M. G. Kong, Plasma Sources Sci. Technol. 19, 025018 (2010). 10.1088/0963-0252/19/2/025018
20. Y.-T. Zhang and S.-Y. Cui, Phys. Plasmas 18, 083509 (2011). 10.1063/1.3626543
21. V. Chakrapani, J. C. Angus, A. B. Anderson, S. D. Wolter, B. R. Stoner, and G. U. Sumanasekera, Science 318, 1424 (2007). 10.1126/science.1148841
22. M. S. Kim, I. G. Koo, M. Y. Choi, J. C. Jung, F. Eldali, J. K. Lee, and G. J. Collins, Plasma Processes Polym. 9, 339-345 (2012). 10.1002/ppap.201100141
23. M. Laroussi, IEEE Trans. Plasma Sci. 37, 714-725 (2009). 10.1109/TPS.2009.2017267
24. S. S. Korshunov and J. A. Imlay, Mol. Microbiol. 43, 95-106 (2002). 10.1046/j.1365-2958.2002.02719.x
25. V. J. Thannickal and B. L. Fanburg, Am. J. Physiol. Lung Cell. Mol. Physiol. 279, L1005-L1028 (2000).
26. S. J. Kim, T. H. Chung, S. H. Bae, and S. H. Leem, Appl. Phys. Lett. 94, 141502 (2009). 10.1063/1.3114407
27. J. P. Lim, H. S. Uhm, and S. Z. Li, Phys. Plasmas 14, 093504 (2007). 10.1063/1.2773705
28. D. X. Liu, M. Z. Rong, X. H. Wang, F. Iza, M. G. Kong, and P. Bruggeman, Plasma Processes Polym. 7, 846-865 (2010). 10.1002/ppap.201000049
29. F. J. Gordillo-Vazquez, J. Phys. D: Appl. Phys. 41, 234016 (2008). 10.1088/0022-3727/41/23/234016
30. T. Shirafuji, T. Morita, O. Sakai, and K. Tachibana, in The 19th International Symposium on Plasma Chemistry, Bochum, Germany, 26-31 July 2009.
31. I. A. Kossyi, A. Y. Kostinsky, A. A. Matveyev, and V. P. Silakov, Plasma Sources Sci. Technol. 1, 207-220 (1992). 10.1088/0963-0252/1/3/011