Correlated electrical and optical studies of hybrid argon gas-water plasmas and their application to tooth whitening

Plasma Processes and Polymers

Volumn 9, Issue 3, 2012, Pages 339-345

  Kim, Myoung Soo ^a   Koo, Il Gyo ^a   Choi, Myeong Yeol ^b   Jung, Jae Chul ^b   Eldali, Fathala ^b   Lee, Jae Koo ^a   Collins, George J ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Engineering Research Center and Hydraulics Laboratory   (United States)

Author keywords

atmospheric pressure plasmas; chemical; liquid plasmas; reactions; tooth whitening

Indexed keywords

ARGON FLOW RATE; ATMOSPHERIC PRESSURE PLASMAS; COOLING EFFECTS; DOMINANT SPECIES; ELECTRICAL CONDUCTIVITY; GAS LIQUIDS; GAS-WATER; INPUT POWER; LIQUID PLASMAS; OPERATING CONDITION; OPTICAL STUDY; PLASMA CHEMICAL REACTIONS; PLASMA LENGTH; PLASMA TREATMENT; RADIO FREQUENCIES; REACTIONS; TOOTH SURFACE; TOOTH WHITENING;

BODY FLUIDS; CHEMICAL REACTIONS; CHEMICALS; ELECTRIC CONDUCTIVITY; GASES; IONIZATION OF GASES; PLASMA APPLICATIONS; PLASMAS; RATE CONSTANTS; TISSUE; TOOTH ENAMEL;

ARGON;

EID: 84863253152     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201100141     Document Type: Article

References (22)

1. H. W. Lee, G. J. Kim, J. M. Kim, J. K. Park, K. Lee, G. C. Kim, J. Endod. 2009, 35, 587.
2. X. Lu, Y. Cao, P. Yang, Q. Xiong, Z. Xiong, Y. Xian, Y. Pan, IEEE Trans. Plasma Sci. 2009, 37, 5.
3. C. Jiang, M. T. Chen, C. Schaudinn, A. Gorur, P. T. Vernier, J. W. Costerton, D. E. Jaramillo, P. P. Sedghizadeh, M. A. Gundersen, IEEE Trans. Plasma Sci. 2009, 37, 7.
4. M. Laroussi, Plasma Process. Polym. 2005, 5, 391.
5. G. C. Kim, G. J. Kim, S. R. Park, S. M. Jeon, H. J. Seo, F. Iza, J. K. Lee, J. Phys. D: Appl. Phys. 2009, 42, 032005.
6. G. Fridman, A. Schereshevsky, M. M. Jost, A. D. Brooks, A. Fridman, A. Gutsol, V. Vasilets, G. Fridman, Plasma Chem. Plasma Processes 2007, 27, 163.
7. K. R. Stalder, J. Woloszko, I. G. Brown, C. D. Smith, Appl. Phys. Lett. 2011, 79, 27.
8. D. V. Palanker, A. Vankov, P. Huie, IEEE Trans. Biomed. Eng. 2009, 55, 2.
9. I. G. Koo, C. A. Moore, M. Y. Choi, G. J. Kim, P. Y. Kim, Y. S. Kim, Z. Yu, G. J. Collins, Plasma. Process. Polym. 2011, 8, 1103.
10. I. G. Koo, M. S. Lee, J. H. Shim, J. H. Ahn, W. M. Lee, J. Mater. Chem. 2005, 15, 4125.
11. A. Rahman, A. P. Yalin, V. Surla, O. Stan, K. Hoshimiya, Z. Yu, E. Littlefield, G. J. Collins, Plasma Sources Sci. Technol. 2004, 13, 537.
12. H. Aoki, K. Kitano, S. Hamaguchi, Plasma Sources Sci. Technol. 2008, 17, 025006.
13. T. Maehara, S. Honda, C. Inokuchi, M. Kuramoto, S. Mukasa, H. Toyota, S. Nomura, A. Kawashima, Plasma Sources Sci. Technol. 2011, 29, 034016.
14. M. Sato, T. Ohgiyama, J. S. Clements, IEEE Trans. Ind. Appl. 1996, 32, 106.
15. T. Kaneko, K. Baba, T. Harada, R. Hatakeyama, Plasma Process. Polym. 2009, 6, 713.
16. F. Liu, P. Sun, N. Bai, Y. Tian, H. Zhou, S. Wei, Y. Zhou, J. Zhang, W. Zhu, K. Becker, J. Fang, Plasma Process. Polym. 2010, 7, 231.
17. LIFBASE: Database and Spectral Simulation Program version 2.0.64, SRI international report MP99- 009, (1999).
18. I. G. Koo, W. M. Lee, Jpn. J. Appl. Phys. 2006, 45, 10A.
19. th ed., John Wiley & Sons, New York, USA 1998, p. 740.
20. D. X. Liu, P. Bruggeman, F. Iza, M. Z. Rong, M. G. Kong, Plasma Sources Sci. Technol. 2010, 19, 025018.
21. E. R. Whittemore, D. T. Loo, J. A. Watts, C. W. Cotman, Neuroscience 1995, 61, 4.
22. Y. C. Chiang, B. S. Lee, Y. L. Wang, Y. A. Cheng, Y. L. Chen, J. S. Shiau, D. M. Wang, C. P. Lin, Lasers Med. Sci. 2008, 23, 41.