Flat bands near Fermi level of topological line defects on graphite

Applied Physics Letters

Volumn 101, Issue 11, 2012, Pages

  Feng, Lei ^a   Lin, Xianqing ^b   Meng, Lan ^a   Nie, Jia Cai ^a   Ni, Jun ^b   He, Lin ^a  

^a BEIJING NORMAL UNIVERSITY   (China)

^b TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AB INITIO CALCULATIONS; ANTIBONDING; CARBON ATOMS; DENSITY OF STATE; EXPERIMENTAL EVIDENCE; FERMI VELOCITIES; FLAT BAND; TOPOLOGICAL DEFECT; TOPOLOGICAL LINES;

FERMI LEVEL; GRAPHITE; TOPOLOGY;

DEFECTS;

EID: 84866321612     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4752441     Document Type: Article

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