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Volumn 24, Issue 39, 2012, Pages
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Defect mediated photocatalytic decomposition of 4-chlorophenol on epitaxial rutile thin films under visible and UV illumination
a
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Author keywords
[No Author keywords available]
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Indexed keywords
4-CHLOROPHENOL;
AFM;
ANNEALING IN VACUUM;
ANNEALING PRESSURE;
ATOMICALLY SHARP INTERFACE;
C-SAPPHIRE;
DARK-FIELD;
DEFECT CONCENTRATIONS;
ELECTRICAL RESISTIVITY;
EPITAXIAL RELATIONSHIPS;
HIGH OXYGEN PRESSURE;
INTERSTITIALS;
LOW-ENERGY VISIBLE LIGHTS;
LOWER PRESSURES;
MODEL MATERIALS;
OXYGEN PRESSURE;
PERFECT CRYSTALS;
PHOTOCATALYTIC DECOMPOSITION;
PHOTOCATALYTIC REACTIONS;
PL SPECTROSCOPY;
PULSED-LASER DEPOSITION TECHNIQUE;
RUTILE FILMS;
RUTILE TIO;
THREE ORDERS OF MAGNITUDE;
TIO;
UV ILLUMINATIONS;
UV- AND;
XRD;
DEFECTS;
ELECTRIC CONDUCTIVITY;
EPITAXIAL GROWTH;
OXIDE MINERALS;
OXYGEN;
POINT DEFECTS;
PULSED LASER DEPOSITION;
RATE CONSTANTS;
SAPPHIRE;
TITANIUM;
TITANIUM DIOXIDE;
VACUUM;
ANNEALING;
4 CHLOROPHENOL;
4-CHLOROPHENOL;
CHLOROPHENOL;
OXYGEN;
TITANIUM;
TITANIUM DIOXIDE;
ARTICLE;
CATALYSIS;
CHEMISTRY;
PHOTOCHEMISTRY;
PRESSURE;
ULTRAVIOLET RADIATION;
VACUUM;
X RAY DIFFRACTION;
CATALYSIS;
CHLOROPHENOLS;
OXYGEN;
PHOTOCHEMICAL PROCESSES;
PRESSURE;
TITANIUM;
ULTRAVIOLET RAYS;
VACUUM;
X-RAY DIFFRACTION;
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EID: 84866262466
PISSN: 09538984
EISSN: 1361648X
Source Type: Journal
DOI: 10.1088/0953-8984/24/39/395005 Document Type: Article |
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Times cited : (20)
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References (25)
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