The characterization of self-Assembled monolayers on copper surfaces by low-temperature plasma mass spectrometry

Journal of the American Society for Mass Spectrometry

Volumn 23, Issue 7, 2012, Pages 1271-1278

  Ma, Lin ^a   Jia, Mingzhe ^a   Hu, Jingbo ^a   Ouyang, Jin ^a   Na, Na ^a  

^a BEIJING NORMAL UNIVERSITY   (China)

Author keywords

Copper; Cyclic voltammetry; Low temperature plasma; Mass spectroscopy; Self Assembled monolayers

Indexed keywords

BARRIER PROPERTIES; COMPARATIVE STUDIES; COPPER SURFACE; CORRELATION COEFFICIENT; CORROSIVE ELECTROLYTES; DIRECT ANALYSIS; FRAGMENT IONS; INHIBITOR EFFICIENCY; LOW TEMPERATURE PLASMAS; MASS SPECTROSCOPY; SAMS; SIMPLE METHOD; SURFACE ADSORPTION;

CHEMISORPTION; CYCLIC VOLTAMMETRY; DESORPTION; MASS SPECTROMETERS; MASS SPECTROMETRY; MOLECULES; PLASMAS; SELF ASSEMBLED MONOLAYERS; TEMPERATURE;

COPPER;

5 MERCAPTO 1 PHENYLTETRAZOLE; COPPER; ELECTROLYTE; N DODECYLMERCAPTAN; SELF ASSEMBLED MONOLAYER; TETRAZOLE DERIVATIVE; THIOL DERIVATIVE; UNCLASSIFIED DRUG;

ADSORPTION; ARTICLE; COMPARATIVE STUDY; CONCENTRATION (PARAMETERS); CORRELATION COEFFICIENT; CORROSION; CYCLIC POTENTIOMETRY; DESORPTION; INHIBITION KINETICS; IONIZATION; LOW TEMPERATURE PLASMA MASS SPECTROMETRY; MASS SPECTROMETRY; RELIABILITY;

EID: 84865835457     PISSN: 10440305     EISSN: 18791123     Source Type: Journal    
DOI: 10.1007/s13361-012-0378-y     Document Type: Article

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