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Volumn 81, Issue , 2012, Pages 90-97
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Internal stress evolution during field-induced crystallization of anodic tantalum oxide
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Author keywords
Anodic tantalum oxide; Crystallization; Internal stress; Tantalum capacitor
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Indexed keywords
ACIDIC ELECTROLYTES;
ANODIC THIN FILMS;
CRYSTALLIZATION PROCESS;
DEGRADATION MECHANISM;
DIELECTRIC LAYER;
ELECTRON BEAM EVAPORATION;
FIELD-INDUCED;
HIGH-RELIABILITY;
IN-SITU MEASUREMENT;
MEDICAL SYSTEMS;
OPTICAL TECHNIQUE;
OXIDE LAYER;
QUARTZ SUBSTRATE;
SALIENT FEATURES;
STRESS AND STRAIN;
STRESS EVOLUTION;
TANTALUM CAPACITORS;
TANTALUM PENTOXIDE;
CAPACITORS;
CRYSTALLIZATION;
DEGRADATION;
ELECTRIC FIELDS;
ELECTROLYTES;
ELECTRON BEAMS;
QUARTZ;
RESIDUAL STRESSES;
TANTALUM;
TANTALUM OXIDES;
ANODIC OXIDATION;
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EID: 84865287576
PISSN: 00134686
EISSN: None
Source Type: Journal
DOI: 10.1016/j.electacta.2012.07.035 Document Type: Article |
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Times cited : (15)
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References (21)
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