On the relation between growth instabilities and internal stress evolution during galvanostatic Ti thin film anodization

Journal of the Electrochemical Society

Volumn 155, Issue 10, 2008, Pages

  Vanhumbeeck, J F ^a   Proost, J ^a,b  

^a UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ECOLOGY; MOLECULAR BEAM EPITAXY; NONMETALS; OXIDE FILMS; OXYGEN; REACTION KINETICS; THICK FILMS; THIN FILM DEVICES;

ANODIC-OXIDE FILMS; ANODIZATION; CURVATURE MEASUREMENTS; GALVANOSTATIC; GALVANOSTATIC CONDITIONS; GROWTH EFFICIENCY; GROWTH INSTABILITIES; HIGH RESOLUTIONS; IN-SITU; INTERNAL STRESSES; OXYGEN EVOLUTION; OXYGEN EVOLUTION REACTION; STRESS EVOLUTION; THIN-FILM ELECTRODES;

FILM GROWTH;

EID: 51849129237     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2958306     Document Type: Article

References (33)

1. J. Yahalom and J. Zahavi, Electrochim. Acta, 15, 1429 (1970).
2. C. K. Dyer and J. S. L. Leach, J. Electrochem. Soc., 125, 1032 (1978).
3. F. Di Quarto, K. Doblhofer, and H. Gerischer, Electrochim. Acta, 23, 195 (1978).
4. J. F. McAleer and L. M. Peter, J. Electrochem. Soc., 129, 1252 (1982).
5. J. S. L. Leach and B. R. Pearson, Corros. Sci., 28, 43 (1988).
6. T. Shibata and Y.-C. Zhu, Corros. Sci., 37, 253 (1995).
7. T. Shibata and Y.-C. Zhu, Corros. Sci., 37, 133 (1995).
8. N. Sato, Electrochim. Acta, 16, 1683 (1971).
9. D. A. Vermilyea, J. Electrochem. Soc., 110, 345 (1963).
10. L. C. Archibald, Electrochim. Acta, 22, 657 (1977).
11. M. A. Butler and D. S. Ginley, J. Electrochem. Soc., 135, 45 (1988).
12. J. C. Nelson and R. A. Oriani, Corros. Sci., 34, 307 (1993).
13. S. N. Sahu, J. Scarminio, and F. Decker, J. Electrochem. Soc., 137, 1150 (1990).
14. K. Ueno, S.-I. Pyun, and M. Seo, J. Electrochem. Soc., 147, 4519 (2000).
15. J.-F. Vanhumbeeck and J. Proost, Electrochim. Acta, 53, 6165 (2008).
16. J. Proost and F. Spaepen, J. Appl. Phys., 91, 204 (2002).
17. J.-F. Vanhumbeeck and J. Proost, ECS Trans. 10.1149/1.2196017, 2 (6), 281 (2007).
18. H. Habazaki, K. Shimizu, S. Nagata, P. Skeldon, G. E. Thompson, and G. C. Wood, Corros. Sci., 44, 1047 (2002).
19. A. Michaelis and J. W. Schultze, Thin Solid Films, 274, 82 (1996).
20. J. L. Delplancke and R. Winand, Electrochim. Acta, 33, 1551 (1988).
21. J.-F. Vanhumbeeck and J. Proost, Colloids Surf., B, 56, 163 (2007).
22. H. Habazaki, M. Uozumi, H. Konno, K. Shimizu, P. Skeldon, and G. E. Thompson, Corros. Sci., 45, 2063 (2003).
23. S. Kudelka, A. Michaelis, and J. W. Schultze, Electrochim. Acta, 41, 863 (1996).
24. P. Skeldon, G. E. Thompson, G. C. Wood, X. Zhou, H. Habazaki, and K. Shimizu, Philos. Mag. A, 76, 729 (1997).
25. E. Zhuravlyova, L. Iglesias-Rubianes, A. Pakes, P. Skeldon, G. E. Thompson, X. Zhou, T. Quance, M. J. Graham, H. Habazaki, and K. Shimizu, Corros. Sci., 44, 2153 (2002).
26. D. A. Vermilyea, J. Electrochem. Soc., 104, 542 (1957).
27. N. F. Jackson, J. Appl. Electrochem., 3, 91 (1973).
28. J. L. Delplancke and R. Winand, Electrochim. Acta, 33, 1539 (1988).
29. P. Bourdet, F. Vacandio, L. Arg̀me, S. Rossi, and Y. Massiani, Thin Solid Films, 483, 205 (2005).
30. D. Laser, M. Yaniv, and S. Gottesfeld, J. Electrochem. Soc., 125, 358 (1978).
31. D. J. Blackwood and L. M. Peter, Electrochim. Acta, 34, 1505 (1989).
32. S. Kudelka and J. W. Schultze, Electrochim. Acta, 42, 2817 (1997).
33. R. Koch, J. Phys.: Condens. Matter, 6, 9519 (1994).