Properties of silicon and metal oxide electrowetting systems

Journal of Adhesion Science and Technology

Volumn 26, Issue 12-17, 2012, Pages 2143-2163

  Papadopoulou, Evie L ^a   Zorba, Vassilia ^a   Stratakis, Emmanuel ^a,b   Fotakis, Costas ^a,b  

^a INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^b UNIVERSITY OF CRETE   (Greece)

Author keywords

Electrowetting; hydrophobicity; PLD; responsive surfaces; Si; TiO2; ultrafast lasers; ZnO

Indexed keywords

ELECTRO WETTING; ELECTROWETTING ON DIELECTRICS; LASER-TEXTURED; METAL OXIDE ELECTRODES; METAL OXIDES; RESPONSIVE SURFACES; SI ELECTRODES; STRUCTURED SURFACES; SUPERHYDROPHOBIC; TIO2; ZNO;

CONTACT ANGLE; ELECTRODES; HYDROPHOBICITY; MATERIALS PROPERTIES; METALLIC COMPOUNDS; PULSED LASER DEPOSITION; SILICON; SURFACE CHEMISTRY; THREE DIMENSIONAL; ULTRAFAST LASERS; WETTING; ZINC OXIDE;

DIELECTRIC DEVICES;

EID: 84865201017     PISSN: 01694243     EISSN: 15685616     Source Type: Journal    
DOI: 10.1163/156856111X600541     Document Type: Article

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