Electrowetting of superhydrophobic ZnO nanorods

Langmuir

Volumn 24, Issue 9, 2008, Pages 5091-5098

  Campbell, Jos Laurie ^a   Breedon, Michael ^a   Latham, Kay ^a   Kalantar Zadeh, Kourosh ^a  

^a RMIT UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT ANGLE; ELECTRODEPOSITION; HYDROPHOBICITY; VOLTAGE MEASUREMENT; ZINC OXIDE;

ELECTROWETTING; LIQUID-PHASE DEPOSITION; MECHANICAL AGITATION; SUPERHYDROPHOBIC NANORODS;

NANORODS;

NANOTUBE; POLITEF; ZINC OXIDE;

ARTICLE; CHEMISTRY; ELECTRON; HYDROPHOBICITY; SCANNING ELECTRON MICROSCOPY; SOLUTION AND SOLUBILITY; SURFACE PROPERTY; TRANSMISSION ELECTRON MICROSCOPY; ULTRASTRUCTURE; X RAY DIFFRACTION;

ELECTRONS; HYDROPHOBICITY; MICROSCOPY, ELECTRON, SCANNING; MICROSCOPY, ELECTRON, TRANSMISSION; NANOTUBES; POLYTETRAFLUOROETHYLENE; SOLUTIONS; SURFACE PROPERTIES; X-RAY DIFFRACTION; ZINC OXIDE;

EID: 44249122018     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la7030413     Document Type: Article

References (45)

1. Quilliet, C.; Berge, B. Curr. Opin. Colloid Interface Sci. 2001, 6 (1), 34-39.
2. Squires, T. M.; Quake, S. R. Rev. Mod. Phys. 2005, 77 (3), 977-1026.
3. Hessel, V.; Lowe, H.; Schonfeld, F. Chem. Eng. Sci. 2005, 60 (8-9), 2479-2501.
4. Mugele, F.; Baret, J. C. J. Phys.: Condens. Matter 1005, 17 (28), R705-R774.
5. Crassous, J., et al. In Liquid lens based on electrowetting: a new adaptive component for imaging applications in consumer electronics, Proceedings of SPIE, Dec 23, 2004; Jiang, W., Suzuki, Y., Eds.; SPIE Adaptive Optics and Applications III; Vol. 5639.
6. Fair, R. B.; Sriniansan, V.; Ren, H.; Paik, V.; Pamula, K.; Pollack, M. G. Electrowetting-Based On-Chip Sample Processing for Integrated Microfluidics, Electron Devices Meeting, Duke University, Durham, NC, Dec 8-10, 2003.
7. Hoshino, K.; Triteyaprasert, S.; Matsumoto, K.; Shimoyama, I. Sens. Actuators, A 2004, 114 (2-3), 473-477.
8. Mach, P.; Krupenkin, T.; Yang, S.; Rogers, J. A. Appl. Phys. Lett. 2002, 81 (2), 202-204.
9. Pollack, M. G.; Fair, R. B.; Shenderov, A. D. Appl. Phys. Lett. 2000, 77 (11), 1725-1726.
10. Kuo, J. S.; Spicar-Mihalic, P.; Rodriguez, I.; Chiu, D. T. Langmuir 2003, 19 (2), 250-255.
11. Lee, J.; Kim, C. J. J. Microelectromech. Syst. 2000, 9 (2), 171-180.
12. Hsieh, J.; Mach, P.; Cattaneo, F.; Yang, S.; Krupenkin, T.; Baldwin, K.; Rogers, J. A. IEEE Photonics Technol Lett. 2003, 15 (1), 81-83.
13. Cattaneo, F.; Baldwin, K.; Yang, S.; Krupenkin, T.; Ramachandran, S.; Rogers, J. A. J. Microelectromech. Syst. 2003, 12 (6), 907-912.
14. Gras, S. L.; Mahmud, T.; Rosengarten, G.; Mitchell, A.; Kalantar-zadeh, K. ChemPhysChem 2007, 8 (14), 2036-2050.
15. Berthier, J.; Dubois, P.;Clementz, P.;Claustre,P.; Peponnet, C.; Fouillet, V. Sens. Actuators, A 2007, 134 (2), 471-479.
16. Chang, Y.-W.; Kwok, D. Y. Biomed. Microdevices 2006, 8 (3), 215-225.
17. Chen, C. Y.; Fabrizio, E. F.; Nadim, A.; Sterling, J. D. Electrowetting-based Microfluidic Devices: Design Issues, Summer Bioengineering Conference, Sonesta Beach Resort, Key Biscayne, FL, June 25-29, 2003; Keck Graduate Institute of Applied Life Sciences: Claremont, CA, 2003.
18. Kang, K. H. Langmuir 2002, 18 (26), 10318-10322.
19. Verheijen, H. J. J.; Prins, M. W. J. Langmuir 1999, 15 (20), 6616-6620.
20. Welters, W. J. J.; Fokkink, L. G. J. Langmuir 1998, 14 (7), 1535-1538.
21. Moon, H.; Cho, S. K.; Garrell, R. L.; Kim, C. J. J. Appl. Phys. 2002, 92 (7), 4080-4087.
22. Lee, J.; Moon, H.; Fowler, J.; Schoellhammer, T.; Kim, C. J. Sens. Actuators, A 2002, 95 (2-3), 259-268.
23. Ralston, J. Aust. J. Chem. 2005, 58 (9), 644-654.
24. Schneemilch, M.; Welters, W. J. J.; Hayes, R. A.; Ralston, J. Langmuir 2000, 16 (6), 2924-2927.
25. Saeki, F.; Baum, J.; Moon, H.; Yoon, J. Y.; Kim, C. J.; Garrell, R. L. Electrowetting on dielectrics: Reducing voltage requirements for microfluidics. Abstr. Pap. Am. Chem. Soc. 2001, 222, U341-U341.
26. Shapiro, B.; Moon, H.; Garrell, R.; Kim, C.-J. MEMS 2003 2003, 201-205.
27. Shapiro, B.; Moon, H.; Garrell, R. L.; Kim, C. J. J. Appl. Phys. 2003, 93 (9), 5794-5811.
28. Zhu, L. B.; Xiu, Y.; Xu, J.; Tamirisa, P. A.; Hess, D. W.; Wong, C.-P. Langmuir 2005, 21 (24), 11208-11212.
29. Rios, P. F.; Dodiuk, H.; Kenig, S.; McCarthy, S.; Dotan, A. J. Adhes. Sci. Technol. 2007, 21 (5-6), 399-408.
30. Verplanck, N.; Galopin, E.; Camart, J.-C.; Thomy, V.; Coffinier, Y.; Boukherroub, R. Nano Lett. 2007, 7 (3), 813-817.
31. Krupenkin, T.; Taylor, J. A.; Kolodner, P.; Hodes, M. Bell Labs Tech. J. 2005, 10(3), 161-170.
32. Zhu, L. B.; Xu, J.; Xiu, Y.; Sun, Y.; Hess, D. W.; Wong, C.-P. J. Phys. Chem B 2006, 110 (32), 15945-15950.
33. Krupenkin, T. N.; Taylor, J. A.; Schneider, T. M.; Yang, S. Langmuir 2004, 20 (10), 3824-3827.
34. Dhindsa, M. S.; Smith, N. R.; Heikenfeld, J.; Rack, P. D.; Fowlkes, J. D.; Doktycz, M. J.; Melechko, A. V.; Simpson, M. L. Langmuir 2006, 22 (21), 9030-9034.
35. Wang, Z.; Ou, Y.; Lu, T.-M.; Koratkar, N. J. Phys. Chem. B 2007, 111 (17), 4296-4299.
36. Liu, H.; Feng, L.; Zhai, J.; Jiang, L.; Zhu, D. Langmuir 2004, 20 (14), 5659-5661.
37. Vayssieres, L. Adv. Mater. 2003, 15 (5), 464-466.
38. Peterson, R. B.; Fields, C. L.; Gregg, B. A. Langmuir 2004, 20 (12), 5114-5118.
39. Lau, K. K. S.; Bico, J.; Teo, K. B. K.; Chhowalla, M.; Amaratunga, G. A. J.; Milne, W. I.; McKinley, G. H.; Gleason, K. K. Nano Lett. 2003, 3 (12), 1701-1705.
40. Feng, L.; Li, S. H.; Li, Y. S.; Li, H. J.; Zhang, L. J.; Zhai, J.; Song, Y. L; Liu, B. Q.; Jiang, L.; Zhu, D. B. Adv. Mater. 2002, 14 (24), 1857-1860.
41. Vallet, M.; Vallade, M.; Berge, B. Eur. Phys. J. B 1999, 11 (4), 583-591.
42. Jagadish, C.; Pearton, J. S. Zinc Oxide Bulk, Thin Films and Nanostructures: Processing, Properties, and Applications, 1st ed.; Elsevier Science: Oxford, U.K., 2006.
43. Cassie, A. B. D.; Baxter, S. Trans. Faraday Soc. 1944, 40, 546.
44. Peykov, V.; Quinn, A.; Ralston, J. Colloid Polym. Sci. 2000, 278 (8), 789-793.
45. Vallet, M.; Berge, B.; Vovelle, L. Polymer 1996, 37 (12), 2465-2470.