Metal-induced solid-phase crystallization of amorphous TiO 2 thin films

Applied Physics Letters

Volumn 101, Issue 5, 2012, Pages

  Yang, Chang ^a,b,c   Hirose, Yasushi ^a,b,c   Nakao, Shoichiro ^b,c   Hoang, Ngoc Lam Huong ^a   Hasegawa, Tetsuya ^a,b,c  

^a UNIVERSITY OF TOKYO   (Japan)

^b KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS TIO; CRYSTALLIZATION MODELS; CRYSTALLIZATION TEMPERATURE; INTERMEDIATE COMPLEX; LOW TEMPERATURES; METAL CONTACTS; NI ATOMS; NI CONTACTS; NI-O BOND; SOLID PHASE CRYSTALLIZATION; TIO;

AMORPHOUS FILMS; COPPER; REACTION INTERMEDIATES; THIN FILMS;

TITANIUM DIOXIDE;

EID: 84864657431     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4739934     Document Type: Article

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