The effect of complexing agents on the oriented growth of electrodeposited microcrystalline cuprous oxide film

Materials Research Bulletin

Volumn 47, Issue 9, 2012, Pages 2561-2565

  Zhang, Zhen ^a   Hu, Wenbin ^a   Deng, Yida ^a   Zhong, Cheng ^a   Wang, Haoren ^a   Wu, Yating ^a   Liu, Lei ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

A. Oxides; A. Thin films; C. Electron microscopy; C. X ray diffraction; D. Crystal structure

Indexed keywords

COMPLEX COMPOUNDS; COMPLEXING AGENTS; COPPER-BASED; CUPROUS OXIDE; DIFFERENT PLANES; EFFECT OF COMPLEXING AGENTS; FORMATION ENERGIES; INDIUM-TIN-OXIDE GLASS SUBSTRATES; ORIENTED GROWTH; OVERPOTENTIAL; STABILITY CONSTANTS;

CITRIC ACID; COPPER COMPOUNDS; ELECTRODEPOSITION; LACTIC ACID; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TIN; TIN OXIDES; X RAY DIFFRACTION;

COPPER;

EID: 84864591974     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2012.04.146     Document Type: Article

References (25)

1. H. Matsumoto, K. Saito, and M. Hasuo Solid State Commun. 97 1996 125 129
2. S.Y. Li, G.J. Mei, and Y.J. Jin Mater. Rev. 19 2005 147 149
3. S. Ikeda, T. Takata, and T. Kondo Chem. Commun. 1998 2185 2186
4. M. Hara, T. Kondo, and M. Komoda Chem. Commun. 1998 357 358
5. S. Bordiga, C. Paze, and G. Berlier Catal. Today 70 2001 91 105
6. E.W. Bohannan, M.G. Shumsky, and J.A. Switzer Chem. Mater. 11 1999 2289 2291
7. J.A. Switzer, B.M. Maune, and E.R. Raub J. Phys. Chem. B 103 1999 395 398
8. P.E. de Jongh, D. Vanmaelkelbergh, and J.J. Kelly Chem. Commun. 1999 1069 1070
9. M. Hara, H. Hasei, and M. Yashima Appl. Catal. A 190 2000 35 42
10. W. Siripala, A. Ivanovskaya, and T.F. Jaramillo Sol. Cells 77 2003 229 237
11. A.E. Rakhshani Solid-State Electron. 29 1986 7 17
12. A.E. Rakhshani, A.A. Al-Jassar, and J. Varghese Thin Solid Films 148 1987 191 201
13. X.J. Zhang, G.F. Wang, and A.X. Gu Solid State Commun. 148 2008 525 528
14. J.Y. Ho, and M.H. Huang J. Phys. Chem. 113 2009 14159 14164
15. G. Rothenberger, J. Moser, and M. Graetzel J. Am. Chem. Soc. 107 1985 8054 8059
16. K. Han, and M. Tao Sol. Energy Mater. Sol. Cells 93 2009 153 157
17. Z.G. Chen, Y.W. Tang, and Z.J. Jia J. Inorg. Mater. 20 2005 367 372
18. B. Hong, C.H. Jiang, and X.J. Wang Surf. Coat. Technol. 201 2007 7449 7452
19. T. Yoshida, K. Miyamoto, and N. Hibi Chem. Lett. 27 1998 599 600
20. M.J. Siegfried, and K.S. Choi Adv. Mater. 16 2004 1743 1746
21. F. Sun, Y. Guo, and W. Song J. Cryst. Growth 304 2007 425 429
22. F. Hu, K.C. Chan, and T.M. Yue Thin Solid Films 518 2009 120 125
23. C.S. Barrett, and T.B. Massalski Structure of Metals 1980 Pergamon Oxford
24. J.L. Fang Theory & Application of Coordination Compounds in Electroplating 2007 Chemical Industry Press China
25. V.M. Kozlov, and L.P. Becelli Mater. Chem. Phys. 77 2002 289 293