Influence of complexing agents on texture formation of electrodeposited copper

Surface and Coatings Technology

Volumn 201, Issue 16-17, 2007, Pages 7449-7452

  Hong, Bo ^a   Jiang, Chuan hai ^a   Wang, Xin jian ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Complexing agent; Electrodeposited copper film; Texture; XRD

Indexed keywords

ACETIC ACID; AGENTS; COATINGS; ELECTRODEPOSITION; FILM THICKNESS; TEXTURES; X RAY DIFFRACTION ANALYSIS;

COMPLEXING AGENTS; COPPER FILM; ELECTRODEPOSITED COPPER; TEXTURE FORMATION;

COPPER;

ACETIC ACID; AGENTS; COATINGS; COPPER; ELECTRODEPOSITION; FILM THICKNESS; TEXTURES; X RAY DIFFRACTION ANALYSIS;

EID: 34047274798     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.02.011     Document Type: Article

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