Initial oxidation of Cu(hkl) surfaces vicinal to Cu(111): A high-throughput study of structure sensitivity

Journal of Physical Chemistry C

Volumn 116, Issue 30, 2012, Pages 16054-16062

  Lawton, T J ^c   Pushkarev, V ^b   Broitman, E ^b,d   Reinicker, A ^b   Sykes, E C H ^c   Gellman, A J ^a,b  

^a NATIONAL ENERGY TECHNOLOGY LABORATORY   (United States)

^b CARNEGIE MELLON UNIVERSITY   (United States)

^c TUFTS UNIVERSITY   (United States)

^d IFM ^*  (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC SCALE IMAGING; CONTINUOUS DISTRIBUTION; CRYSTALLOGRAPHIC ORIENTATIONS; CU(1 1 1); HIGH-THROUGHPUT; INITIAL ORIENTATION; INITIAL OXIDATION; INITIAL STAGES; KINK DENSITY; OXIDE LAYER; OXYGEN UPTAKE; POLAR ANGLES; SPATIALLY RESOLVED; STEP EDGE; STM IMAGES; STRUCTURE SENSITIVITY; STRUCTURE-SENSITIVE; SURFACE ORIENTATION; SURFACE OXIDE LAYER; SURFACE STEPS;

DEGREES OF FREEDOM (MECHANICS); KINETIC THEORY; OXYGEN; PHOTOELECTRONS; SCANNING TUNNELING MICROSCOPY; SINGLE CRYSTALS; SURFACE CHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDATION;

EID: 84864491562     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp303488t     Document Type: Article

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