The adsorption and dissociation of O2 molecular precursors on Cu: The effect of steps

Surface Science

Volumn 538, Issue 3, 2003, Pages 219-232

  Xu, Ye ^a   Mavrikakis, Manos ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

Catalysis; Copper; Corrosion; Density functional calculations; Metal semiconductor interfaces; Oxidation; Oxygen; Surface defects

Indexed keywords

ACTIVATION ENERGY; ADSORPTION; BINDING ENERGY; CATALYSIS; DISSOCIATION; OXIDATION; OXYGEN; PROBABILITY DENSITY FUNCTION;

MOLECULAR PRECURSORS;

COPPER;

EID: 0038449331     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)00787-8     Document Type: Article

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