Dual-stage lithography from a light-driven, plasmon-assisted process: A hierarchical approach to subwavelength features

Langmuir

Volumn 28, Issue 30, 2012, Pages 10957-10961

  Stamplecoskie, Kevin G ^a   Fasciani, Chiara ^a   Scaiano, Juan C ^a  

^a UNIVERSITY OF OTTAWA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION LIMITS; DUAL STAGE; EXCITED PARTICLES; HIERARCHICAL APPROACH; KETYL RADICALS; M-LINES; NANOPARTICLE SURFACE; NYLON-6; PLASMON EXCITATIONS; SILVER NANOPARTICLES; SUB-DIFFRACTION LIMIT; SUB-WAVELENGTH; TWO-STEP REACTIONS;

DIFFRACTION; IMAGING TECHNIQUES; POLYAMIDES; RAYON; SILVER;

PLASMONS;

EID: 84864454052     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la301728r     Document Type: Article

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