Retention model for high-density ReRAM

2012 4th IEEE International Memory Workshop, IMW 2012

Volumn , Issue , 2012, Pages

  Wei, Z ^a   Takagi, T ^a   Kanzawa, Y ^a   Katoh, Y ^a   Ninomiya, T ^a   Kawai, K ^a   Muraoka, S ^a   Mitani, S ^a   Katayama, K ^a   Fujii, S ^a   Miyanaga, R ^a   Kawashima, Y ^a   Mikawa, T ^a   Shimakawa, K ^a   Aono, K ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

Filament; ReRAM; Retention

Indexed keywords

HIGH-RESISTANCE STATE; LOW-RESISTANCE STATE; OXYGEN DIFFUSION; RERAM; RETENTION; RETENTION MODELS;

FILAMENTS (LAMP);

DEGRADATION;

EID: 84864140747     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMW.2012.6213638     Document Type: Conference Paper

References (6)

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