Novel dual-layer photoelectrode prepared by RF magnetron sputtering for photocatalytic water splitting

International Journal of Hydrogen Energy

Volumn 37, Issue 16, 2012, Pages 11632-11639

  Liao, Chi Hung ^a,b   Huang, Chao Wei ^a   Wu, Jeffrey C S ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b INSTITUTE OF NUCLEAR ENERGY RESEARCH   (Taiwan)

Author keywords

Photocatalytic water splitting; Solar hydrogen; Sputtering deposition; Visible light photocatalyst

Indexed keywords

CHARGE SEPARATIONS; CHEMICAL COMPOSITIONS; CRYSTALLINITIES; DEPOSITION TECHNIQUE; DUAL LAYER; DUAL LAYER STRUCTURE; INSTRUMENTAL ANALYSIS; PHOTOACTIVITY; PHOTOCATALYTIC PERFORMANCE; PHOTOCATALYTIC PROPERTY; PHOTOCATALYTIC THIN FILMS; PHOTOCATALYTIC WATER SPLITTING; PHOTOELECTRODE; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; SEM-EDX; SOLAR HYDROGEN; SPUTTERING CONDITIONS; SPUTTERING DEPOSITION; TIO; UV- AND; UV-VISIBLE ABSORPTION SPECTROMETRY; VISIBLE LIGHT; VISIBLE-LIGHT IRRADIATION; VISIBLE-LIGHT PHOTOCATALYSTS; WATER SPLITTING; XRD;

ABSORPTION SPECTROSCOPY; DEPOSITION; HYDROGEN; MAGNETRON SPUTTERING; PHOTOCATALYSIS; SOLAR POWER GENERATION; THIN FILMS; TITANIUM DIOXIDE; VAPOR DEPOSITION;

FILM PREPARATION;

EID: 84863781417     PISSN: 03603199     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijhydene.2012.05.107     Document Type: Article

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