Light controlled magnetoresistance and magnetic field controlled photoresistance in CoFe film deposited on BiFeO 3

Applied Physics Letters

Volumn 100, Issue 26, 2012, Pages

  Kundys, B ^a   Meny, C ^a   Gibbs, M R J ^b   Da Costa, V ^a   Viret, M ^c   Acosta, M ^a   Colson, D ^c   Doudin, B ^a  

^a INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

^b UNIVERSITY OF SHEFFIELD   (United Kingdom)

^c SERVICE DE PHYSIQUE DE L ETAT CONDENSÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC MAGNETORESISTANCE; INCIDENT LIGHT; MAGNETIC SWITCHING; MAGNETO-ELASTIC; MAGNETORESISTIVE MEMORIES; PHOTORESISTANCE; PIEZOMAGNETIC; RESEARCH DEVELOPMENT; WAVELENGTH DETECTOR;

ELECTRIC RESISTANCE; MAGNETIC FIELDS; MAGNETORESISTANCE; SENSORS;

MAGNETOELECTRONICS;

EID: 84863309317     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4731201     Document Type: Article

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