Tailoring non-linear dielectric properties by local field engineering in anisotropic porous ferroelectric structures

Applied Physics Letters

Volumn 100, Issue 25, 2012, Pages

  Padurariu, Leontin ^a   Curecheriu, Lavinia ^a   Galassi, Carmen ^b   Mitoseriu, Liliana ^a  

^a ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

^b CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC POROSITY; APPLIED FIELD; FERROELECTRIC STRUCTURE; FIELD-INDUCED; LOCAL FIELD DISTRIBUTION; LOCAL FIELDS; NONLINEAR DIELECTRIC PROPERTIES; PORE ORIENTATIONS; POROSITY LEVEL; POROUS CERAMICS; POROUS MICROSTRUCTURE; TUNABILITIES;

ANISOTROPY; CERAMIC MATERIALS; LEAD; ZIRCONIUM;

PERMITTIVITY;

EID: 84863308983     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4729878     Document Type: Article

References (24)

1. J. Im, O. Auciello, P. K. Baumann, S. K. Streiffer, D. Y. Kaufman, and A. R. Krauss, Appl. Phys. Lett. 76, 625 (2000). 10.1063/1.125839
2. C. L. Canedy, H. Li, S. P. Alpay, L. S. Riba, A. L. Roytburd, and R. Ramesh, Appl. Phys. Lett. 77, 1695 (2000). 10.1063/1.1308531
3. A. K. Tagantsev, V. O. Sherman, K. F. Astafiev, J. Venkatesh, and N. Setter, J. Electroceram. 11, 5 (2003). 10.1023/B:JECR.0000015661.81386.e6
4. M. W. Cole, P. C. Joshi, and M. H. Ervin, J. Appl. Phys. 89, 6336 (2001). 10.1063/1.1366656
5. R. H. Liang, X. L. Dong, Y. Chen, F. Cao, and Y. L. Wang, Jpn. J. Appl. Phys., Part 1 43, 201 (2004). 10.1143/JJAP.43.201
6. U.-C. Chung, C. Elissalde, M. Maglione, C. Estournes, M. Pate, and J. P. Ganne, Appl. Phys. Lett. 92, 042902 (2008). 10.1063/1.2837621
7. M. W. Cole, P. C. Joshi, M. H. Ervin, M. C. Wood, and R. L. Pfeffer, Thin Solid Films 374, 34 (2000). 10.1016/S0040-6090(00)01059-2
8. Y. Chen, X. L. Dong, R. H. Liang, J. T. Li, and Y. L. Wang, J. Appl. Phys. 98, 064107 (2005). 10.1063/1.2058194
9. L. P. Curecheriu, M. T. Buscaglia, V. Buscaglia, Z. Zhao, and L. Mitoseriu, Appl. Phys. Lett. 97, 242909 (2010). 10.1063/1.3526375
10. Y. Zhang, G. Wang, K. Wang, Y. Wang, and X. Dong, J. Appl. Phys. 103, 114103 (2008). 10.1063/1.2937196
11. W. Wersing, K. Lubitz, and J. Mohaupt, Ferroelectrics 68, 77 (1986). 10.1080/00150198608238739
12. R. E. Newnham, D. P. Skinner, and L. E. Cross, Mater. Res. Bull. 13, 525 (1978). 10.1016/0025-5408(78)90161-7
13. K. Okazaki and K. Nagata, J. Am. Ceram. Soc. 56, 82 (1973). 10.1111/j.1151-2916.1973.tb12363.x
14. E. Defay, T. Lacrevaz, T. T. Vo, V. Sbrugnera, C. Bermond, M. Aid, and B. Flechet, Appl. Phys. Lett. 94, 052901 (2009). 10.1063/1.3072348
15. K. Johnson, J. Appl. Phys. 33, 2826 (1962). 10.1063/1.1702558
16. M. S. Gockenback, Understanding and Implementing the Finite Element Method (Society for Industrial and Applied Mathematics, 2006).
17. A. C. Polycarpou, Introduction to the Finite Element Method in Electromagnetics (Morgan Claypool, 2006).
18. E. Becker, G. B. Carey, and J. T. Oden, Finite Elements An introduction (Prentice-Hall, 1981).
19. B. Sareni, L. Krahenhuhl, A. Beroual, and C. Brosseau, J. Appl. Phys. 80, 1688 (1996); 10.1063/1.362969
20. B. Sareni, L. Krahenhuhl, A. Beroual, and C. Brosseau, J. Appl. Phys. 80, 4560 (1996); 10.1063/1.363438
21. B. Sareni, L. Krahenhuhl, A. Beroual, and C. Brosseau, J. Appl. Phys. 81, 2375 (1997); 10.1063/1.364276
22. C. Brosseau, A. Beroual, and A. Bouaida, J. Appl. Phys. 88, 7278 (2000). 10.1063/1.1321779
23. X. H. Zhao, Y. G. Wu, Z. G. Fan, and F. Li, J. Appl. Phys. 95, 8110 (2004). 10.1063/1.1712017
24. L. Stoleriu, A. Stancu, L. Mitoseriu, D. Piazza, and C. Galassi, Phys. Rev. B 74, 174107 (2006). 10.1103/PhysRevB.74.174107