Visible light-responsive titanium dioxide thin film prepared by reactive sputtering

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 2, 2011, Pages 1565-1568

  Jeong, Woon Jo ^a   Moon, In Seob ^a   Cho, Soon Kye ^a   Yang, Hyeon Hun ^b   Park, Gye Choon ^b   Gu, Hal Bon ^c   Kim, Ki Joong ^d   Ahn, Ho Geun ^d  

^a Chosun University   (South Korea)

^b Mokpo National University   (South Korea)

^c Chonnam National University   (South Korea)

^d Sunchon National University   (South Korea)

Author keywords

Photo catalyst; Sputtering; TiO 2

Indexed keywords

ABSORPTION EDGES; BAND GAPS; IMPURITY LEVEL; OXYGEN PARTIAL PRESSURE; PHOTOCATALYTIC ACTIVITIES; TIO; TIO 2; TITANIUM DIOXIDE THIN FILM; ULTRA-VIOLET LIGHT; VISIBLE SPECTRA; WIDE-BAND-GAP SEMICONDUCTOR;

CATALYSTS; FILM PREPARATION; PHOTOCATALYSIS; QUANTUM YIELD; SPUTTERING; THIN FILMS; ULTRAVIOLET RADIATION;

TITANIUM DIOXIDE;

EID: 84863012899     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.3380     Document Type: Conference Paper

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