Measurement of OH radicals at state X 2 in an atmospheric-pressure micro-flow dc plasma with liquid electrodes in He, Ar and N 2 by means of laser-induced fluorescence spectroscopy

Journal of Physics D: Applied Physics

Volumn 45, Issue 12, 2012, Pages

  Li, L ^a   Nikiforov, A ^a,b   Xiong, Q ^a,c   Lu, X ^c   Taghizadeh, L ^a   Leys, C ^a  

^a GHENT UNIVERSITY   (Belgium)

^b RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

^c HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ABSOLUTE DENSITY; DC PLASMA; LASER INDUCED FLUORESCENCE SPECTROSCOPY; LIF SIGNAL; LIQUID ELECTRODES; MICRO-FLOW; OH RADICAL; PLASMA CORE; TIME DECAY; TRANSLATION ENERGY; WATER ELECTRODE; WATER VAPOUR;

ATMOSPHERIC MOVEMENTS; ELECTRIC DISCHARGES; ENERGY TRANSFER; FLUORESCENCE SPECTROSCOPY; FREE RADICALS; LASER PRODUCED PLASMAS;

DENSITY OF GASES;

EID: 84863275174     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/45/12/125201     Document Type: Article

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